Nonlinear frequency conversion based on a fiber amplifier at 977 nm for the indium atom lithography

Atom lithography (AL) is one of the interesting applications in atom optics where the atomic motion is controlled by laser beam or magnetic force (Meschede and Metcalf, 2003). In our group, we have focused on the AL using indium atoms which promises application in semiconductor physics. A standing-wave light field can be used as micro-lens array to focus atoms onto a substrate. Due to the small dipole force, a well-collimated atomic beam is required for AL. The collimation can be realized by transverse laser cooling.