DocumentCode :
2164417
Title :
Sensitivity-enhanced SERS substrate fabrication by nanoimprinting compressed PDMS elastomer
Author :
Wen-Kai Kuo ; Jia-Nan Yan ; Wing-Ming Chou ; Hsin-Her Yu
Author_Institution :
Dept. of Electro-Opt., Nat. Formosa Univ., Yunlin, Taiwan
fYear :
2013
fDate :
18-22 Aug. 2013
Firstpage :
139
Lastpage :
140
Abstract :
This paper reports a low-cost fabrication method of sensitivity-enhanced SERS substrate using nanoimprinting lithography. A PDMS elastomer with grating structure is deformed by compressing to achieve the better pitch for SERS substrate. Experimental results show that the sensitivity can be enhanced about three times by this method.
Keywords :
compressibility; diffraction gratings; elastomers; nanolithography; optical fabrication; optical polymers; substrates; surface enhanced Raman scattering; compressed PDMS elastomer; deformation; grating structure; nanoimprinting lithography; sensitivity-enhanced SERS substrate fabrication; Gratings; Nanobioscience; Optical surface waves; Rough surfaces; Substrates; Surface roughness; Surface waves;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Optical MEMS and Nanophotonics (OMN), 2013 International Conference on
Conference_Location :
Kanazawa
ISSN :
2160-5033
Print_ISBN :
978-1-4799-1512-5
Type :
conf
DOI :
10.1109/OMN.2013.6659098
Filename :
6659098
Link To Document :
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