Ultrawideband characterisation of photoimageable thick film materials for microwave and millimeter-wave design

Author

Samanta, K.K. ; Stephens, D. ; Robertson, I.D.

Author_Institution

Inst. of Microwave & Photonics, Leeds Univ., UK

fYear

2005

fDate

12-17 June 2005

Abstract

This paper describes the accurate characterization of a photoimageable thick film dielectric with 1 to 110 GHz measurements on a two port microstrip ring resonator. The loss tangent is found to remain below 0.006 up to over 110 GHz. The line losses are found to be better than many reported results for thin film technology, with less than 0.2dB/mm at 80 GHz. Using the data, a 64 GHz bandpass filter and a lumped element 3 GHz low pass filter are designed and measured.

Keywords

band-pass filters; dielectric materials; low-pass filters; microstrip resonators; microwave filters; millimetre wave filters; thick films; 1 to 110 GHz; 3 GHz; 64 GHz; bandpass filter; dielectric materials; line losses; lumped element low pass filter; microstrip circuits; microwave design; millimeter-wave circuits; millimeter-wave design; photoimageable thick film dielectrics; photoimageable thick film materials; thick film circuits; two port microstrip ring resonator; ultrawideband characterisation; Dielectric films; Dielectric materials; Dielectric measurements; Dielectric thin films; Microstrip resonators; Millimeter wave measurements; Millimeter wave technology; Thick films; Thickness measurement; Ultra wideband technology;

fLanguage

English

Publisher

ieee

Conference_Titel

Microwave Symposium Digest, 2005 IEEE MTT-S International

ISSN

01490-645X

Print_ISBN

0-7803-8845-3

Type

conf

DOI

10.1109/MWSYM.2005.1517177

Filename

1517177