Title :
Effect of lithography stitching errors on Silicon-on-Insulator photonic wires
Author :
Gnan, M. ; Sorel, M. ; Macintyre, Douglas S. ; Pottier, P. ; Thorns, S. ; De La Rue, R.M.
Author_Institution :
Glasgow Univ., Glasgow
Abstract :
Electron beam lithography (EBL) is a widely used tool in the patterning of photonic integrated circuits, either by direct writing or by UV lithography with e-beam defined masks. It provides the benefit of pattern flexibility, high accuracy and the required nanometre-scale resolution.
Keywords :
electron beam lithography; integrated optics; electron beam lithography; lithography stitching errors; photonic integrated circuits; silicon-on-insulator photonic wires; Attenuation; Circuits; Error correction; Gratings; Lithography; Optical losses; Propagation losses; Silicon on insulator technology; Wires; Writing;
Conference_Titel :
Lasers and Electro-Optics, 2007 and the International Quantum Electronics Conference. CLEOE-IQEC 2007. European Conference on
Conference_Location :
Munich
Print_ISBN :
978-1-4244-0930-3
DOI :
10.1109/CLEOE-IQEC.2007.4386611
