• DocumentCode
    2167502
  • Title

    On the average-gap model in amorphous materials

  • Author

    Tomozeiu, Nicolae

  • Author_Institution
    Fac. of Phys., Bucharest Univ., Romania
  • Volume
    1
  • fYear
    1997
  • fDate
    7-11 Oct 1997
  • Firstpage
    211
  • Abstract
    The dispersion of the subband refractive index in amorphous semiconductors is well described by “average gap” model which is based on two-band model of optical transitions. The disorder potentials due to the “electrostatic” and “elastic” forces determine the variation of the conduction-and valence-band edges. The average gap is defined as the difference between the most probable values of the bottom of the conduction band and the top of the valence band. The model is applied on a-Si1-xCx:H, a-C:H and a-SiOxNy layers
  • Keywords
    amorphous semiconductors; conduction bands; refractive index; valence bands; C:H; SiC:H; SiON; amorphous semiconductors; average-gap model; conduction band; disorder potentials; elastic forces; electrostatic forces; optical transitions; subband refractive index; two-band model; valence band edges; Absorption; Amorphous materials; Amorphous semiconductors; Density measurement; Electrostatics; Optical refraction; Optical variables control; Photonic band gap; Physics; Refractive index;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Semiconductor Conference, 1997. CAS '97 Proceedings., 1997 International
  • Conference_Location
    Sinaia
  • Print_ISBN
    0-7803-3804-9
  • Type

    conf

  • DOI
    10.1109/SMICND.1997.651582
  • Filename
    651582