• DocumentCode
    2167660
  • Title

    Defective wafer detection using multiple classifiers

  • Author

    Boubezoul, Abderrahmane ; Annanou, Bouchra ; Ouladsine, Mustapha ; Paris, Sebastien

  • Author_Institution
    Lab. of Sci. of Inf.´s & of Syst., Univ. Paul Cezanne, Marseille, France
  • fYear
    2007
  • fDate
    2-5 July 2007
  • Firstpage
    2929
  • Lastpage
    2934
  • Abstract
    In a semiconductor factory, Parametric Tests (PT) are performed to check if a particular product is within a certain predefined specifications, and to detect possible process drifts as early as possible. In addition, PT results are used to decide based on Statistical Process Control (SPC) charts whether to accept or to reject a wafer1. These methods lead to stop many lots unnecessarily. In this paper, we introduce an automatic wafer classification approach based on combining learning algorithms to improve the detection rate of defective wafers. This procedure was successfully validated at PT data provided by STMicroelectronics - Rousset fab. Results show significant reduction of the number of lots stopped unnecessarily.
  • Keywords
    fault diagnosis; learning (artificial intelligence); pattern classification; semiconductor device manufacture; semiconductor device testing; statistical process control; SPC charts; automatic wafer classification approach; defective wafers detection; detection rate; learning algorithms; parametric tests; process drifts; semiconductor factory; statistical process control charts; Accuracy; Electric variables measurement; Prototypes; Semiconductor device measurement; Support vector machines; Training; Vectors;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Control Conference (ECC), 2007 European
  • Conference_Location
    Kos
  • Print_ISBN
    978-3-9524173-8-6
  • Type

    conf

  • Filename
    7068795