DocumentCode
2167660
Title
Defective wafer detection using multiple classifiers
Author
Boubezoul, Abderrahmane ; Annanou, Bouchra ; Ouladsine, Mustapha ; Paris, Sebastien
Author_Institution
Lab. of Sci. of Inf.´s & of Syst., Univ. Paul Cezanne, Marseille, France
fYear
2007
fDate
2-5 July 2007
Firstpage
2929
Lastpage
2934
Abstract
In a semiconductor factory, Parametric Tests (PT) are performed to check if a particular product is within a certain predefined specifications, and to detect possible process drifts as early as possible. In addition, PT results are used to decide based on Statistical Process Control (SPC) charts whether to accept or to reject a wafer1. These methods lead to stop many lots unnecessarily. In this paper, we introduce an automatic wafer classification approach based on combining learning algorithms to improve the detection rate of defective wafers. This procedure was successfully validated at PT data provided by STMicroelectronics - Rousset fab. Results show significant reduction of the number of lots stopped unnecessarily.
Keywords
fault diagnosis; learning (artificial intelligence); pattern classification; semiconductor device manufacture; semiconductor device testing; statistical process control; SPC charts; automatic wafer classification approach; defective wafers detection; detection rate; learning algorithms; parametric tests; process drifts; semiconductor factory; statistical process control charts; Accuracy; Electric variables measurement; Prototypes; Semiconductor device measurement; Support vector machines; Training; Vectors;
fLanguage
English
Publisher
ieee
Conference_Titel
Control Conference (ECC), 2007 European
Conference_Location
Kos
Print_ISBN
978-3-9524173-8-6
Type
conf
Filename
7068795
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