• DocumentCode
    2167782
  • Title

    Numerical simulation method for liquid crystal aberration compensation device

  • Author

    Suzuki, Yuya ; Iwasaki, Naoki ; Kobayashi, S. ; Sasaki, Hiromu

  • Author_Institution
    Opt. Technol. Dept., Olympus Opt. Co. Ltd., Tokyo, Japan
  • fYear
    2002
  • fDate
    2002
  • Firstpage
    57
  • Lastpage
    59
  • Abstract
    In advanced optical recording systems, a storage capacity of more than 20 Gbytes has been reached by adopting blue laser diodes, 0.85 numerical aperture (NA) objectives and 0.1 mm thin cover layer medium. This has been accompanied by a reduction of the optical and mechanical tolerance of the recording system. Among the parameters above, thickness error tolerance of the disc cover layer is said to be less than 3 μm for mitigating the severe disc tilt tolerance. In order to mitigate such tolerances, an aberration compensation device is strongly required. The co-refractive index liquid crystal (LC) panel is one of the promising candidates as the aberration compensation device and has been extensively studied. The refractive index of an LC depends on the applied electric field; and thus the refractive index distribution can be controlled by the electrode configuration and the applied voltage. Although the direct measurement of spherical aberration is the best method for evaluating the performance, numerical estimation methods are also required for better device design. In this paper, we report on an optical simulation method for numerically evaluating the LC aberration compensation panel and show the performance and optical tolerance of the device. By using the optical simulation method, we numerically optimize the LC aberration compensation device and show the device can be applicable to the layer jump of 25 μm for the dual layer optical recording, in next generation optical memory.
  • Keywords
    CAD; aberrations; electrodes; error compensation; lenses; liquid crystal devices; numerical analysis; optical disc storage; optimisation; refractive index; semiconductor lasers; tolerance analysis; 0.1 mm; 20 Gbyte; LC panels; advanced optical recording systems; applied control voltage; applied electric fields; blue laser diodes; co-refractive index liquid crystal panel; cover layer medium; device optimization; disc cover layer thickness error tolerance; disc tilt tolerance; dual layer optical recording; electrode configuration; liquid crystal aberration compensation devices; mechanical tolerances; numerical simulation methods; objective NA; objective numerical aperture; optical memory; optical performance; optical simulation methods; optical tolerances; refractive index distribution control; spherical aberration; storage capacity; Apertures; Diode lasers; Liquid crystal devices; Numerical simulation; Optical devices; Optical recording; Optical refraction; Optical variables control; Refractive index; Voltage control;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Optical Memory and Optical Data Storage Topical Meeting, 2002. International Symposium on
  • Print_ISBN
    0-7803-7379-0
  • Type

    conf

  • DOI
    10.1109/OMODS.2002.1028566
  • Filename
    1028566