• DocumentCode
    2168075
  • Title

    DUV attenuating structures in fused silica induced by ultrafsat laser radiation

  • Author

    Oshemkov, Sergey ; Dmitriev, Vladimir ; Zait, Eitan ; Ben-Zvi, Guy

  • Author_Institution
    Pixer Technol., Karmiel
  • fYear
    2007
  • fDate
    17-22 June 2007
  • Firstpage
    1
  • Lastpage
    1
  • Abstract
    In this paper we present the method for high-speed 3D structures patterning inside the volume of photomask substrate without affecting front mask surface and absorber layer using ultrafast laser and the results of investigation of DUV radiation attenuation by created structures.
  • Keywords
    high-speed optical techniques; laser beam effects; laser beams; laser materials processing; light absorption; masks; silicon compounds; DUV radiation attenuation; SiO2; fused silica structures; high-speed 3D structures patterning; photomask substrate; ultrafast laser radiation; Energy resolution; Laser beams; Machine vision; Optical attenuators; Optical pulses; Silicon compounds; Solid lasers; Surface emitting lasers; Throughput; Visualization;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Lasers and Electro-Optics, 2007 and the International Quantum Electronics Conference. CLEOE-IQEC 2007. European Conference on
  • Conference_Location
    Munich
  • Print_ISBN
    978-1-4244-0931-0
  • Electronic_ISBN
    978-1-4244-0931-0
  • Type

    conf

  • DOI
    10.1109/CLEOE-IQEC.2007.4386677
  • Filename
    4386677
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=2168075