DocumentCode :
2168384
Title :
Metamorphic HEMT Technology for Microwave, Millimeter-Wave, and Submillimeter-Wave Applications
Author :
Komiak, J.J. ; Smith, P.M. ; Duh, K.H.G. ; Xu, D. ; Chao, P.C.
Author_Institution :
Electron. Syst., BAE Syst., Nashua, NH, USA
fYear :
2013
fDate :
13-16 Oct. 2013
Firstpage :
1
Lastpage :
4
Abstract :
This paper reviews recent progress in the development of GaAs Metamorphic HEMT (MHEMT) technology for microwave, millimeter-wave, and submillimeter-wave applications. Short gate-length (50-100 nm) Metamorphic High Electron Mobility Transistors have been optimized for high gain and low noise performance. Efforts to further improve performance, manufacturability, and verify reliability will be reported. We also describe the design and performance of low noise MMIC amplifiers based on this technology.
Keywords :
HEMT integrated circuits; III-V semiconductors; MMIC amplifiers; gallium arsenide; low noise amplifiers; GaAs; low noise MMIC amplifiers; low noise performance; metamorphic HEMT technology; metamorphic high electron mobility transistors; microwave applications; size 50 nm to 100 nm; submillimeter-wave applications; Gallium arsenide; Indium phosphide; Logic gates; MMICs; Noise; mHEMTs;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Compound Semiconductor Integrated Circuit Symposium (CSICS), 2013 IEEE
Conference_Location :
Monterey, CA
Type :
conf
DOI :
10.1109/CSICS.2013.6659237
Filename :
6659237
Link To Document :
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