Title :
A 90nm Floating Gate "B4-Flash" Memory Technology- Breakthrough of the Gate Length Limitation on NOR Flash Memory
Author :
Ogura, T. ; Mihara, M. ; Kawajiri, Y. ; Kobayashi, K. ; Shimizu, S. ; Shukuri, S. ; Ajika, N. ; Nakashima, M.
Author_Institution :
GENUSION, Inc., Amagasaki
Abstract :
A 90 nm floating gate NOR B4-Flash memory with IF (F: minimum feature size) gate length cell has been investigated by using 64 Mbit test chip to evaluate the scalability of B4-Flash memory. 90 nm (=1F) gate length of memory cell is shortest in many NOR flash memories reported previously. Basic program and erase characteristics and robust program disturb immunity of B4-Flash memory utilizing NMOS select transistor in memory cell array have been demonstrated. Furthermore, to simplify the peripheral circuits and reduce a die size, a new charge pump circuit which can generate both positive and negative high voltage at a supply voltage of 1.8 V has been introduced.
Keywords :
MOSFET; NOR circuits; charge pump circuits; flash memories; nanoelectronics; B4-Flash memory scalability; NMOS select transistor; NOR flash memory; charge pump circuit; erase characteristics; floating gate B4-Flash memory technology; gate length cell; memory cell array; peripheral circuit; robust program disturb immunity; size 90 nm; voltage 1.8 V; Channel hot electron injection; Charge pumps; Circuit testing; Flash memory; MOS devices; Memory architecture; Nonvolatile memory; Robustness; Scalability; Voltage;
Conference_Titel :
Memory Workshop, 2009. IMW '09. IEEE International
Conference_Location :
Monterey, CA
Print_ISBN :
978-1-4244-3762-7
DOI :
10.1109/IMW.2009.5090573