DocumentCode :
2169688
Title :
From Atomistic to Device Level Investigation of Hybrid Redox Molecular/Silicon Field-Effect Memory Devices
Author :
Buckley, J. ; Pro, T. ; Barattin, R. ; Calborean, A. ; Huang, K. ; Aiello, V. ; Nicotra, G. ; Gély, M. ; Delapierre, G. ; Jalaguier, E. ; Duclairoir, F. ; Chevalier, N. ; Mariolle, D. ; Spinella, C. ; Lombardo, S. ; Blaise, P. ; Maldivi, P. ; Ghibaudo, G.
Author_Institution :
CEA-LETI-MINATEC, CEA-INAC, Grenoble
fYear :
2009
fDate :
10-14 May 2009
Firstpage :
1
Lastpage :
4
Abstract :
In this paper an extensive investigation of hybrid molecular/silicon field-effect memories is presented, where Redox Ferrocene (Fc) molecules play the role of the memory charge storage nodes. Engineering of the organic linkers between Fc and Si is achieved by grafting Fc with different linker lengths. The study shows a clear correlation between results from atomistic computational Density Functional Theory (DFT), electrochemical measurements (Cyclic Voltammetry) and electrical data obtained by a detailed study on Pseudo-MOS devices. Physical- chemical analyses (Atomic Force Microscopy, high-resolution Transmission Electron Microscopy, X-Ray Photoelectron Spectroscopy), were used to monitor the molecular layers.
Keywords :
MOS memory circuits; X-ray photoelectron spectra; atomic force microscopy; density functional theory; elemental semiconductors; organic semiconductors; silicon; transmission electron microscopy; voltammetry (chemical analysis); Redox Ferrocene molecules; X-ray photoelectron spectroscopy; atomic force microscopy; atomistic computational density functional theory; charge storage nodes; cyclic voltammetry; electrochemical measurements; high-resolution transmission electron microscopy; hybrid molecular/silicon field-effect memories; molecular layers; organic linkers; pseudo-MOS devices; Atomic force microscopy; Atomic layer deposition; Atomic measurements; Chemical analysis; Density functional theory; Density measurement; Electric variables measurement; Photoelectron microscopy; Silicon; Transmission electron microscopy;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Memory Workshop, 2009. IMW '09. IEEE International
Conference_Location :
Monterey, CA
Print_ISBN :
978-1-4244-3762-7
Type :
conf
DOI :
10.1109/IMW.2009.5090591
Filename :
5090591
Link To Document :
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