DocumentCode
2170281
Title
Performance Characterization of TSV in 3D IC via Sensitivity Analysis
Author
You, Jhih-Wei ; Huang, Shi-Yu ; Kwai, Ding-Ming ; Chou, Yung-Fa ; Wu, Cheng-Wen
Author_Institution
Electr. Eng. Dept., Nat. Tsing Hua Univ., Hsinchu, Taiwan
fYear
2010
fDate
1-4 Dec. 2010
Firstpage
389
Lastpage
394
Abstract
In this paper, we propose a method that can characterize the propagation delays across the Through Silicon Vias (TSVs) in a 3D IC. We adopt the concept of the oscillation test, in which two TSVs are connected with some peripheral circuit to form an oscillation ring. Upon this foundation, we propose a technique called sensitivity analysis to further derive the propagation delay of each individual TSV participating in the oscillation ring-a distilling process. In this process, we perturb the strength of the two TSV drivers, and then measure their effects in terms of the change of the oscillation ring´s period. By some following analysis, the propagation delay of each TSV can be revealed. Monte-Carlo analysis of a typical TSV with 30% process variation on transistors shows that the characterization error of this method is only 2.1% with the standard deviation of 8.1%.
Keywords
Monte Carlo methods; sensitivity analysis; three-dimensional integrated circuits; 3D IC; Monte Carlo analysis; TSV; propagation delay; sensitivity analysis; through silicon vias; Capacitance; Delay; Driver circuits; Oscillators; Three dimensional displays; Through-silicon vias; 3D-IC; Performance Characterization; Ring Oscillation; TSV; Testing;
fLanguage
English
Publisher
ieee
Conference_Titel
Test Symposium (ATS), 2010 19th IEEE Asian
Conference_Location
Shanghai
ISSN
1081-7735
Print_ISBN
978-1-4244-8841-4
Type
conf
DOI
10.1109/ATS.2010.73
Filename
5692278
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