DocumentCode :
2170346
Title :
Ultra-thin RF LDMOS Power Transistors
Author :
Herbsommer, J.A. ; Safar, H. ; Brown, W. ; Gammel, P. ; Lopez, O. ; Terefenko, G.
Author_Institution :
Agere Systems, 700 Mountain Ave. Murray Hill NJ 07974, USA.
fYear :
2002
fDate :
23-26 Sept. 2002
Firstpage :
1
Lastpage :
4
Abstract :
We present the electrical and thermal performance of ultra-thin RF LDMOS devices. Following a proprietary process, we fabricated such devices with a thickness as reduced as 40¿m. This results in a reduction of the operating junction temperature, as demonstrated by infrared imaging experiments and three-dimensional finite-element-analysis simulations. As a result, the thermal resistance of our packaged devices reaches substantially lower values than industry standard. This allows for a higher power output and improved efficiency, as demonstrated by RF measurements.
Keywords :
Electric resistance; Electrical resistance measurement; Finite element methods; Infrared imaging; Packaging; Power measurement; Power transistors; Radio frequency; Temperature; Thermal resistance;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Microwave Conference, 2002. 32nd European
Conference_Location :
Milan, Italy
Type :
conf
DOI :
10.1109/EUMA.2002.339276
Filename :
4140356
Link To Document :
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