DocumentCode :
2172169
Title :
Extremely low noise characteristics of 0.1μm Γ-gate power metamorphic HEMT on GaAs substrate
Author :
Yoon, Hyung Sup ; Lee, Jin Hee ; Shim, Jae Yeob ; Hong, Ju Yeon ; Kang, Dong Min ; Lee, Kyung Ho
Author_Institution :
High Speed SOC Res. Dept., Electron. & Telecommun. Res. Inst., Taejeon, South Korea
fYear :
2005
fDate :
8-12 May 2005
Firstpage :
133
Lastpage :
136
Abstract :
The 0.1 μm Γ-gate power metamorphic high electron mobility transistors (MHEMTs) has been fabricated and the DC, microwave, and noise performance of the device were characterized. The MHEMT device shows the DC output characteristics having an extrinsic transconductance of 830 mS/mm and a threshold voltage of □0.62 V. The fT and fmax obtained for the 0.1 μm×100 μm MHEMT device are 165 GHz and 275 GHz, respectively. The MHEMTs exhibit the minimum noise figure, NFmin, of 0.64 dB and associated gain of 12.4 dB at 26 GHz. The NFmin measured at 40 GHz is 1.1 dB with associated gain of 9.7 dB. This noise data is the lowest value ever reported for Γ-gate power MHEMT devices with InGaAs channel of 53% In.
Keywords :
electrical conductivity; high electron mobility transistors; power HEMT; Γ-gate power metamorphic high electron mobility transistors; 0.62 V; 0.64 dB; 1.1 dB; 12.4 dB; 26 GHz; 40 GHz; 830 mS/mm; 9.7 dB; DC output characteristics; GaAs; GaAs substrate; InGaAs channel; MHEMT device; extrinsic transconductance; microwave performance; minimum noise figure; noise performance; threshold voltage; Gain; Gallium arsenide; HEMTs; MODFETs; Microwave devices; Noise figure; Noise measurement; Threshold voltage; Transconductance; mHEMTs;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Indium Phosphide and Related Materials, 2005. International Conference on
ISSN :
1092-8669
Print_ISBN :
0-7803-8891-7
Type :
conf
DOI :
10.1109/ICIPRM.2005.1517437
Filename :
1517437
Link To Document :
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