DocumentCode :
2174157
Title :
Development of 6-inch Fe-doped InP single crystal by vertical boat method
Author :
Hosaka, Noriyuki ; Hashio, Katsushi ; Fujiwara, Shinya ; Okita, Kyoko ; Hosokawa, Yoshihiro
Author_Institution :
Sumiden Semicond. Mater. Co. Ltd., Hyogo, Japan
fYear :
2005
fDate :
8-12 May 2005
Firstpage :
398
Lastpage :
401
Abstract :
We have succeeded in developing 6-inch Fe doped semi-insulating InP substrates by the VB (Vertical Boat) method. To compare 6-inch substrates and commercially available 4-inch Fe-doped substrates by VB and VCZ (Vapor pressure Controlled Czochralski) methods, we measured dislocation density, X-ray topography, and electrical properties. 6-inch VB-substrates showed equivalent properties to VB substrates and much better properties than 4-inch VCZ substrates. We believe that the VB method is the most promising technology for growing 6-inch InP single crystal as well as 4-inch or smaller InP single crystals.
Keywords :
III-V semiconductors; X-ray topography; crystal growth from melt; crystal structure; dislocation density; indium compounds; iron; semiconductor growth; substrates; 6-inch Fe-doped semi-insulating InP single crystal; InPFe; X-ray topography; commercially available 4-inch Fe-doped substrates; dislocation density; electrical properties; vapor pressure controlled Czochralski method; vertical boat method; Boats; Crystals; Indium phosphide; Iron; Mass production; Semiconductor materials; Shape control; Shipbuilding industry; Substrates; Thermal stresses;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Indium Phosphide and Related Materials, 2005. International Conference on
ISSN :
1092-8669
Print_ISBN :
0-7803-8891-7
Type :
conf
DOI :
10.1109/ICIPRM.2005.1517511
Filename :
1517511
Link To Document :
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