• DocumentCode
    2174157
  • Title

    Development of 6-inch Fe-doped InP single crystal by vertical boat method

  • Author

    Hosaka, Noriyuki ; Hashio, Katsushi ; Fujiwara, Shinya ; Okita, Kyoko ; Hosokawa, Yoshihiro

  • Author_Institution
    Sumiden Semicond. Mater. Co. Ltd., Hyogo, Japan
  • fYear
    2005
  • fDate
    8-12 May 2005
  • Firstpage
    398
  • Lastpage
    401
  • Abstract
    We have succeeded in developing 6-inch Fe doped semi-insulating InP substrates by the VB (Vertical Boat) method. To compare 6-inch substrates and commercially available 4-inch Fe-doped substrates by VB and VCZ (Vapor pressure Controlled Czochralski) methods, we measured dislocation density, X-ray topography, and electrical properties. 6-inch VB-substrates showed equivalent properties to VB substrates and much better properties than 4-inch VCZ substrates. We believe that the VB method is the most promising technology for growing 6-inch InP single crystal as well as 4-inch or smaller InP single crystals.
  • Keywords
    III-V semiconductors; X-ray topography; crystal growth from melt; crystal structure; dislocation density; indium compounds; iron; semiconductor growth; substrates; 6-inch Fe-doped semi-insulating InP single crystal; InPFe; X-ray topography; commercially available 4-inch Fe-doped substrates; dislocation density; electrical properties; vapor pressure controlled Czochralski method; vertical boat method; Boats; Crystals; Indium phosphide; Iron; Mass production; Semiconductor materials; Shape control; Shipbuilding industry; Substrates; Thermal stresses;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Indium Phosphide and Related Materials, 2005. International Conference on
  • ISSN
    1092-8669
  • Print_ISBN
    0-7803-8891-7
  • Type

    conf

  • DOI
    10.1109/ICIPRM.2005.1517511
  • Filename
    1517511