• DocumentCode
    2175059
  • Title

    Inductively coupled plasma etching of deep photonic crystal holes in InP using Cl/sub 2/

  • Author

    Carlstrom, C.F. ; van der Heijden, R. ; Kok, A.A.M. ; van der Heijden, R.W. ; Karouta, F. ; van der Tol, J.J.G.M. ; Nötzel, R. ; van Veldhoven, P.J. ; Salemink, H.W.M.

  • Author_Institution
    COBRA Inter-Univ. Res. Inst., Eindhoven Univ. of Technol.
  • fYear
    2005
  • fDate
    8-12 May 2005
  • Firstpage
    500
  • Lastpage
    503
  • Abstract
    We have investigated ICP-etching of deep photonic crystal holes in InP using solely Cl2 as supplied etching gas. The influence of process parameters on hole geometry is discussed and optical test results are reported
  • Keywords
    III-V semiconductors; indium compounds; photonic crystals; sputter etching; InP; deep photonic crystal holes; etching gas; hole geometry; inductively coupled plasma etching; optical test; Etching; Heating; Indium phosphide; Lattices; Optical device fabrication; Optical waveguides; Photonic crystals; Plasma applications; Plasma measurements; Plasma temperature;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Indium Phosphide and Related Materials, 2005. International Conference on
  • Conference_Location
    Glasgow, Scotland
  • ISSN
    1092-8669
  • Print_ISBN
    0-7803-8891-7
  • Type

    conf

  • DOI
    10.1109/ICIPRM.2005.1517542
  • Filename
    1517542
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=2175059