DocumentCode :
2175059
Title :
Inductively coupled plasma etching of deep photonic crystal holes in InP using Cl/sub 2/
Author :
Carlstrom, C.F. ; van der Heijden, R. ; Kok, A.A.M. ; van der Heijden, R.W. ; Karouta, F. ; van der Tol, J.J.G.M. ; Nötzel, R. ; van Veldhoven, P.J. ; Salemink, H.W.M.
Author_Institution :
COBRA Inter-Univ. Res. Inst., Eindhoven Univ. of Technol.
fYear :
2005
fDate :
8-12 May 2005
Firstpage :
500
Lastpage :
503
Abstract :
We have investigated ICP-etching of deep photonic crystal holes in InP using solely Cl2 as supplied etching gas. The influence of process parameters on hole geometry is discussed and optical test results are reported
Keywords :
III-V semiconductors; indium compounds; photonic crystals; sputter etching; InP; deep photonic crystal holes; etching gas; hole geometry; inductively coupled plasma etching; optical test; Etching; Heating; Indium phosphide; Lattices; Optical device fabrication; Optical waveguides; Photonic crystals; Plasma applications; Plasma measurements; Plasma temperature;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Indium Phosphide and Related Materials, 2005. International Conference on
Conference_Location :
Glasgow, Scotland
ISSN :
1092-8669
Print_ISBN :
0-7803-8891-7
Type :
conf
DOI :
10.1109/ICIPRM.2005.1517542
Filename :
1517542
Link To Document :
https://search.ricest.ac.ir/dl/search/defaultta.aspx?DTC=49&DC=2175059
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