DocumentCode :
2175994
Title :
Analysis on reverse electrostatic discharge induced degradation of GaInAsP/InP laser diodes
Author :
Ichikawa, H. ; Kumagai, A. ; Hamada, K. ; Yamaguchi, A. ; Nakabayashi, T.
Author_Institution :
Transmission devices R&D Labs., Sumitomo Electr. Ind. Ltd., Yokohama
fYear :
2005
fDate :
8-12 May 2005
Firstpage :
629
Lastpage :
632
Abstract :
We clarified the principal mechanism of reverse ESD induced degradation caused by concentration of high electric field inside MQW from theoretical and experimental results. We found that the strength of electric field depends on both thickness of depletion layer and doping concentration of current blocking layer
Keywords :
III-V semiconductors; doping profiles; electrostatic discharge; gallium arsenide; indium compounds; semiconductor lasers; semiconductor quantum wells; GaInAsP-InP; current blocking layer; depletion layer; doping concentration; electric field strength; principal mechanism; reverse electrostatic discharge induced degradation; semiconductor laser diodes; semiconductor multiple quantum wells; Coatings; Degradation; Diode lasers; Electrostatic analysis; Electrostatic discharge; Indium phosphide; Protection; Radiative recombination; Testing; Voltage;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Indium Phosphide and Related Materials, 2005. International Conference on
Conference_Location :
Glasgow, Scotland
ISSN :
1092-8669
Print_ISBN :
0-7803-8891-7
Type :
conf
DOI :
10.1109/ICIPRM.2005.1517575
Filename :
1517575
Link To Document :
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