Intraband InAs/InAlGaAs/InP Quantum Dot Detectors for the MIR

In this work, the authors presented the results of a detailed optical characterization of specially designed stacked self-assembled InAs/InGaAlAs/InGaAs/InP QDIP structures grown by metalorganic vapor phase epitaxy. The QDIP active region consists of an InGaAs quantum well grown on InGaAlAs followed by a thin InGaAlAs layer on top of which the dots are nucleated. The ternary and the quaternary material are lattice matched to InP. The dots are then covered by a thin InP barrier which helps reducing the dark current and is more convenient to be grown at the same temperature as the dots themselves.