DocumentCode
2178667
Title
Hot carrier injection effect on threshold voltage of NMOSFETs
Author
Lahbib, Insaf ; Doukkali, Aziz ; Martin, Patrick ; Imbert, Guy ; Raoulx, Denis
Author_Institution
Normandie Université ENSICAEN/ CRISMAT/UMR 6508, 6 boulevard Maréchal Juin, 14050 Caen cedex 04, France
fYear
2015
fDate
June 29 2015-July 2 2015
Firstpage
164
Lastpage
167
Abstract
In this paper, Hot Carrier (HC) injection mechanism effect on NMOSFETs´ Threshold Voltage (VTh ) is examined. The purpose of this work is to predict VTh degradation, under DC hot carrier stress conditions, of NMOS transistors for different channel lengths and widths, using a simulation reliability tool owned by NXP semiconductors and validate simulation results with HC degradation model. VTh extraction is conducted using Constant Current (CC) threshold voltage method.
Keywords
Aging; Degradation; Hot carriers; Reliability; Stress; Threshold voltage; Transistors; aging time; hot carrier degradation; reliability simulation; threshold voltage extraction; threshold voltage shift;
fLanguage
English
Publisher
ieee
Conference_Titel
Ph.D. Research in Microelectronics and Electronics (PRIME), 2015 11th Conference on
Conference_Location
Glasgow, United Kingdom
Type
conf
DOI
10.1109/PRIME.2015.7251360
Filename
7251360
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