DocumentCode :
2180140
Title :
Synthesis and characterization of SrTiO3 thin films by a modified metalorganic decomposition technique
Author :
Ng, T.B. ; Xu, J.B. ; Hu, G.D. ; Cheung, W.Y. ; Ke, N. ; Wilson, I.H.
Author_Institution :
Dept. of Electron. Eng., Chinese Univ. of Hong Kong, Shatin, China
fYear :
2002
fDate :
2002
Firstpage :
15
Lastpage :
19
Abstract :
High quality strontium titanate thin films on platinized Si(100) have been synthesized using non-poisonous inorganic solvent and a layer-by-layer annealing technique at different temperatures. The films have shown good structural and electrical properties. The dielectric constant and dissipation factor at a frequency of 100 MHz are 230 and 0.05, respectively, for a 80 nm thick film annealed at 650°C. The capacitance versus applied voltage characteristic shows that the capacitance is almost independent of the applied voltage. The leakage current density is found to be in the order of 10-7 A/cm2 for the film in an applied electric field of about 100 kV/cm.
Keywords :
annealing; capacitance; current density; dielectric losses; dielectric thin films; leakage currents; permittivity; pyrolysis; strontium compounds; 100 MHz; 650 C; 80 nm; Pt-Si; Si; SrTiO3 thin films; SrTiO3-Pt-Si; SrTiO3-Si; annealing temperatures; applied electric field; capacitance versus applied voltage characteristic; dielectric constant; dissipation factor; film electrical properties; film structural properties; layer-by-layer annealing technique; leakage current density; modified metalorganic decomposition technique; nonpoisonous inorganic solvent; platinized Si(100) substrates; strontium titanate thin films; Annealing; Capacitance; Dielectric constant; Dielectric thin films; Frequency; Solvents; Strontium; Temperature; Titanium compounds; Voltage;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Electron Devices Meeting, 2002. Proceedings. 2002 IEEE Hong Kong
Print_ISBN :
0-7803-7429-0
Type :
conf
DOI :
10.1109/HKEDM.2002.1029147
Filename :
1029147
Link To Document :
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