DocumentCode :
2183643
Title :
The study on the shaping of electroplated copper pillar bumping
Author :
Han, Ying ; Li, Ming ; Sun, Hongqi ; Sun, Jiangyan
Author_Institution :
State Key Lab. of Metal Matrix Composites, Shanghai Jiao Tong Univ., Shanghai, China
fYear :
2011
fDate :
8-11 Aug. 2011
Firstpage :
1
Lastpage :
4
Abstract :
With the increasing connection density of ICs, the technology of flip chip packaging and stacked-die packaging bounded by bumping are gradually replacing the traditional wire bonding to become one of the main styles of the package. And as one of the critical technology the technology of electroplating copper pillar wins more and more concern. This paper concerns about the influence of the electroplating additives which includes accelerator, leveler and the density of electroplating current to the forming of copper pillar. And by adjusting the quantity of the additives and the density of electroplating current, we got the satisfactory copper pillar with the smooth surface.
Keywords :
copper; electronics packaging; electroplated coatings; flip-chip devices; Cu; connection density; electroplated copper pillar bumping; electroplating copper pillar; flip chip packaging; stacked-die packaging; wire bonding; Copper; Current density; Morphology; Packaging; Scanning electron microscopy; Surface morphology; Surface topography;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Electronic Packaging Technology and High Density Packaging (ICEPT-HDP), 2011 12th International Conference on
Conference_Location :
Shanghai
Print_ISBN :
978-1-4577-1770-3
Electronic_ISBN :
978-1-4577-1768-0
Type :
conf
DOI :
10.1109/ICEPT.2011.6066842
Filename :
6066842
Link To Document :
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