DocumentCode :
2187680
Title :
Potential and current distribution in the interelectrode gap of the vacuum arc in a magnetic field
Author :
Keidar, M. ; Beilis, I. ; Boxman, R.L. ; Goldsmith, S.
Author_Institution :
Electr. Discharge & Plasma Lab., Tel Aviv Univ., Israel
Volume :
1
fYear :
1996
fDate :
21-26 Jul 1996
Firstpage :
146
Abstract :
The plasma jet focusing and voltage distribution in the interelectrode gap of a vacuum arc with a ring anode and subjected to an axial magnetic field were studied theoretically. A 2-dimensional model was developed based on the free plasma jet expansion into vacuum and the steady state solution of the fully ionized plasma in the hydrodynamic approximation was analyzed. It was found that the imposition of an axial magnetic field reduces the radial expansion of the plasma jet. The plasma density on the axis increases by a factor of 2 with imposition of a 20 mT magnetic field. The arc voltage increased with the imposition of a magnetic field, and also increased with the anode length. The arc voltage consists of the cathode drop, the plasma voltage drop and anode sheath drop. The model was compared with experimental measurements of the vacuum arc voltage behavior in an axial magnetic field, and good agreement was found
Keywords :
anodes; cathodes; current distribution; magnetic fields; plasma density; plasma focus; plasma jets; plasma magnetohydrodynamics; plasma sheaths; vacuum arcs; 2-dimensional model; 20 mT; anode sheath drop; axial magnetic field; current distribution; fully ionized plasma; hydrodynamic approximation; interelectrode gap; magnetic field; plasma density; plasma jet focusing; plasma voltage drop; potential distribution; ring anode; steady state solution; vacuum arc; Anodes; Current distribution; Hydrodynamics; Magnetic field measurement; Magnetic fields; Plasma density; Plasma measurements; Steady-state; Vacuum arcs; Voltage;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Discharges and Electrical Insulation in Vacuum, 1996. Proceedings. ISDEIV., XVIIth International Symposium on
Conference_Location :
Berkeley, CA
Print_ISBN :
0-7803-2906-6
Type :
conf
DOI :
10.1109/DEIV.1996.545338
Filename :
545338
Link To Document :
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