Simulation-based nonlinear filtering with redundant observations and bounded disturbances

Author

Lee, Ji-Woong ; Khargonekar, Pramod P.

Author_Institution

Dept. of Electr. Eng. & Comput. Sci., Michigan Univ., Ann Arbor, MI, USA

Volume

3

fYear

2001

fDate

2001

Firstpage

2125

Abstract

This paper proposes a nonlinear filtering algorithm for unknown dynamics and high-complexity observations. We show that the algorithm yields bounded error under redundant observations and small bounded disturbances. The algorithm is a generalization of what we have used to achieve the first reported real-time estimation of submicron patterned wafer geometries during a plasma etching process with spectral reflectometry

Keywords

filtering theory; observability; process control; real-time systems; reflectometry; semiconductor device manufacture; sputter etching; state estimation; bounded disturbances; nonlinear filtering; plasma etching process; real-time systems; redundant observations; semiconductor device manufacture; spectral reflectometry; state estimation; submicron wafer geometries; Computational modeling; Etching; Filtering algorithms; Nonlinear optics; Optical feedback; Optical filters; Optical scattering; Plasma applications; Semiconductor device modeling; Semiconductor process modeling;

fLanguage

English

Publisher

ieee

Conference_Titel

Decision and Control, 2001. Proceedings of the 40th IEEE Conference on

Conference_Location

Orlando, FL

Print_ISBN

0-7803-7061-9

Type

conf

DOI

10.1109/.2001.980567

Filename

980567