DocumentCode :
2189019
Title :
Extended Gate H+-Ion Sensitive Field Effect Transistor with Signal Interface
Author :
Chen, Chung-Yuan ; Hsieh, Hsiu-Li ; Lin, Chia-Hsien ; Liao, Sheng-Kai ; Sun, Tai-Ping ; Ching, Congo Tak-Shing ; Liu, Po-Liang
Author_Institution :
Inst. of Electr. Eng., Nat. Chi Nan Univ., Nantou, Taiwan
fYear :
2009
fDate :
17-19 Oct. 2009
Firstpage :
1
Lastpage :
4
Abstract :
An extended gate ion sensitive field effect transistor with signal interface was presented for continuous monitoring of H+-ion concentrations. The SnO2/ITO glass, fabricated by sputtering SnO2 on the conductive ITO glass, was used as a pHsensitive membrane of extended gate field effect transistor (EGFET). The signal processing circuits, constructed by using differential sensing and noise shaping techniques, converted the H+-ion concentration into digital form. This chip, fabricated in a 0.18-um CMOS 1P6M process, operated at a 1.8 V supply voltage and normal sampling rate of 6.25 MHz. The circuit (without pad) occupied an area of 0.66 mm times 0.43 mm. The experimental data showed that this structure has a linear pH response about 97 digital counts/pH in the ion concentration range between pH2 and pH12, and the gain errors within the H+-ion concentrations are less than 3%. The minimum detectable pH value can reach as small as plusmn0.25 pH.
Keywords :
CMOS integrated circuits; indium compounds; ion sensitive field effect transistors; signal processing equipment; tin compounds; CMOS 1P6M process; EGFET; H+-ion concentrations; SnO2-ITO; SnO2/ITO glass; conductive ITO glass; differential sensing techniques; extended gate H+-ion sensitive field effect transistor; linear pH response; noise shaping techniques; pH-sensitive membrane; signal interface; signal processing circuits; sputtering; voltage 1.8 V; Biomembranes; CMOS process; Circuits; Digital signal processing chips; FETs; Glass; Indium tin oxide; Monitoring; Noise shaping; Sputtering;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Biomedical Engineering and Informatics, 2009. BMEI '09. 2nd International Conference on
Conference_Location :
Tianjin
Print_ISBN :
978-1-4244-4132-7
Electronic_ISBN :
978-1-4244-4134-1
Type :
conf
DOI :
10.1109/BMEI.2009.5305321
Filename :
5305321
Link To Document :
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