• DocumentCode
    2189609
  • Title

    Predicting ion charge state distributions of vacuum arc plasmas

  • Author

    Anders, André ; Schülke, Thomas

  • Author_Institution
    Lawrence Berkeley Lab., CA, USA
  • Volume
    1
  • fYear
    1996
  • fDate
    21-26 Jul 1996
  • Firstpage
    199
  • Abstract
    Multiply charged ions are present in vacuum arc plasmas. The ions are produced at cathode spots, and their charge state distributions (CSDs) depend on the cathode material but only little on the arc current or other parameters as long as the current is relatively low and the anode is not actively involved in the plasma production. There are experimental data of ion CSDs available in the literature for 50 different cathode materials. The CSDs can be calculated based on the assumption that thermodynamic equilibrium is valid in the vicinity of the cathode spot, and the equilibrium CSDs “freeze” at a certain distance from the cathode spot (transition to a nonequilibrium plasma). Plasma temperatures and densities at the “freezing points” have been calculated, and, based on the existence of characteristic groups of elements in the Periodic Table, predictions of CSDs can be made for metallic elements which have not yet been used as cathode materials
  • Keywords
    cathodes; ion emission; plasma density; plasma production; plasma temperature; thermodynamics; vacuum arcs; cathode materials; cathode spots; charge state distributions prediction; ion charge state distributions; plasma densities; plasma production; plasma temperatures; thermodynamic equilibrium; vacuum arc plasmas; Anodes; Cathodes; Inorganic materials; Plasma density; Plasma materials processing; Plasma properties; Plasma temperature; Production; Thermodynamics; Vacuum arcs;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Discharges and Electrical Insulation in Vacuum, 1996. Proceedings. ISDEIV., XVIIth International Symposium on
  • Conference_Location
    Berkeley, CA
  • Print_ISBN
    0-7803-2906-6
  • Type

    conf

  • DOI
    10.1109/DEIV.1996.545350
  • Filename
    545350