DocumentCode :
2191185
Title :
A generalized method for evaluating the metallization thickness effects on microstrip structures
Author :
Tzyy-Sheng Horng
Author_Institution :
Dept. of Electr. Eng., Nat. Sun Yat-Sen Univ., Kaohsiung, Taiwan
fYear :
1994
fDate :
23-27 May 1994
Firstpage :
1009
Abstract :
This paper presents a generalized method for analyzing microstrip structures with finite metallization thickness. A spectral-domain approach that adopts proper current expansion functions is employed to find the three-dimensional current distribution in a finitely thick microstrip. Comparison of computed dispersion curves with available published data for microstrip lines of finite thickness illustrates the accuracy of this method. The influence of metallization thickness on discontinuities like patches and open-ends is also demonstrated.<>
Keywords :
current distribution; metallisation; microstrip lines; spectral-domain analysis; waveguide theory; current expansion functions; discontinuities; dispersion curves; metallization thickness effects; microstrip structures; open-ends; patches; spectral-domain approach; three-dimensional current distribution; Current distribution; Metallization; Microstrip;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Microwave Symposium Digest, 1994., IEEE MTT-S International
Conference_Location :
San Diego, CA, USA
ISSN :
0149-645X
Print_ISBN :
0-7803-1778-5
Type :
conf
DOI :
10.1109/MWSYM.1994.335185
Filename :
335185
Link To Document :
بازگشت