Title :
Comparative analysis of metal and optical interconnect technology
Author :
Jiang, D. ; Bhuva, B.L. ; Kerns, D.V., Jr. ; Kerns, S.E.
Author_Institution :
Dept. of Electr. Eng. & Comput. Sci., Vanderbilt Univ., Nashville, TN, USA
Abstract :
Barriers to industrial implementation of optical interconnects on an IC center on the balance between power requirements and speed improvements over existing metal interconnect systems. This paper focuses on such comparison based on empirically measured quantum efficiency and circuit-level projections. Multiple forms of clock distribution schemes are analyzed to show that the power requirements for optical interconnect are comparable to those of conventional metal interconnects. Implementing optical technology on long interconnect lines will improve the speed performance of ICs. The availability of such a method will allow design engineers to guide the partitioning of optical and conventional interconnects within ICs
Keywords :
clocks; integrated circuit interconnections; optical interconnections; IC design; clock distribution; metal interconnect technology; optical interconnect technology; quantum efficiency; Availability; Clocks; Design engineering; Design methodology; Integrated circuit interconnections; Metals industry; Optical design; Optical interconnections; Photonic integrated circuits; Power system interconnection;
Conference_Titel :
Interconnect Technology Conference, 2000. Proceedings of the IEEE 2000 International
Conference_Location :
Burlingame, CA
Print_ISBN :
0-7803-6327-2
DOI :
10.1109/IITC.2000.854270
