DocumentCode
2191902
Title
Comparative analysis of metal and optical interconnect technology
Author
Jiang, D. ; Bhuva, B.L. ; Kerns, D.V., Jr. ; Kerns, S.E.
Author_Institution
Dept. of Electr. Eng. & Comput. Sci., Vanderbilt Univ., Nashville, TN, USA
fYear
2000
fDate
2000
Firstpage
25
Lastpage
27
Abstract
Barriers to industrial implementation of optical interconnects on an IC center on the balance between power requirements and speed improvements over existing metal interconnect systems. This paper focuses on such comparison based on empirically measured quantum efficiency and circuit-level projections. Multiple forms of clock distribution schemes are analyzed to show that the power requirements for optical interconnect are comparable to those of conventional metal interconnects. Implementing optical technology on long interconnect lines will improve the speed performance of ICs. The availability of such a method will allow design engineers to guide the partitioning of optical and conventional interconnects within ICs
Keywords
clocks; integrated circuit interconnections; optical interconnections; IC design; clock distribution; metal interconnect technology; optical interconnect technology; quantum efficiency; Availability; Clocks; Design engineering; Design methodology; Integrated circuit interconnections; Metals industry; Optical design; Optical interconnections; Photonic integrated circuits; Power system interconnection;
fLanguage
English
Publisher
ieee
Conference_Titel
Interconnect Technology Conference, 2000. Proceedings of the IEEE 2000 International
Conference_Location
Burlingame, CA
Print_ISBN
0-7803-6327-2
Type
conf
DOI
10.1109/IITC.2000.854270
Filename
854270
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