• DocumentCode
    2191902
  • Title

    Comparative analysis of metal and optical interconnect technology

  • Author

    Jiang, D. ; Bhuva, B.L. ; Kerns, D.V., Jr. ; Kerns, S.E.

  • Author_Institution
    Dept. of Electr. Eng. & Comput. Sci., Vanderbilt Univ., Nashville, TN, USA
  • fYear
    2000
  • fDate
    2000
  • Firstpage
    25
  • Lastpage
    27
  • Abstract
    Barriers to industrial implementation of optical interconnects on an IC center on the balance between power requirements and speed improvements over existing metal interconnect systems. This paper focuses on such comparison based on empirically measured quantum efficiency and circuit-level projections. Multiple forms of clock distribution schemes are analyzed to show that the power requirements for optical interconnect are comparable to those of conventional metal interconnects. Implementing optical technology on long interconnect lines will improve the speed performance of ICs. The availability of such a method will allow design engineers to guide the partitioning of optical and conventional interconnects within ICs
  • Keywords
    clocks; integrated circuit interconnections; optical interconnections; IC design; clock distribution; metal interconnect technology; optical interconnect technology; quantum efficiency; Availability; Clocks; Design engineering; Design methodology; Integrated circuit interconnections; Metals industry; Optical design; Optical interconnections; Photonic integrated circuits; Power system interconnection;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Interconnect Technology Conference, 2000. Proceedings of the IEEE 2000 International
  • Conference_Location
    Burlingame, CA
  • Print_ISBN
    0-7803-6327-2
  • Type

    conf

  • DOI
    10.1109/IITC.2000.854270
  • Filename
    854270