Title :
Cell Growth Orientated in Substrate Fabricated by Holographic Lithography and Nanoimprint Lithography
Author :
Sun, Hongwen ; Liu, Jingquan ; Chen, Di
Author_Institution :
Coll. of Comput. & Inf. Eng., Hohai Univ. Changzhou, Changzhou, China
Abstract :
The nanostructures in the substrate for cell culture have an important impact on the cell growth. Nanoimprint lithography (NIL) is an economic way to provide disposable substrates because NIL is a low-cost and straightforward mass production technique. Novel nanoimprint stamps fabrication method of using holographic lithography (HL) was employed. The uniform nanostructures in the stamp consisting of ridged or grooved were replicated to polyethylene terephthalate glycol (PETG) substrates. The atomic force microscopy measurement showed that the average width of grooves was 550 nm and that the replication fidelity was high. C6 glioma, SD mouse ostoblast, and vascular smooth muscle cells were then cultivated on the patterned samples, respectively. The optical and field emission-scanning electron microscope results indicated that ordered nanogroove structures on the substrate can guide cell alignment and oriented growth along definite directions. These results have vital implications for the future direction of cell biology and biosensor research.
Keywords :
atomic force microscopy; biological techniques; cellular biophysics; muscle; nanolithography; scanning electron microscopy; C6 glioma; SD mouse ostoblast; atomic force microscopy; biosensor research; cell alignment; cell biology; cell growth; field emission-scanning electron microscope; holographic lithography; nanogroove structures; nanoimprint lithography; optical scanning electron microscope; polyethylene terephthalate glycol; uniform nanostructures; vascular smooth muscle cells; Atomic force microscopy; Atomic measurements; Force measurement; Holography; Lithography; Mass production; Nanobioscience; Nanolithography; Nanostructures; Optical microscopy;
Conference_Titel :
Biomedical Engineering and Informatics, 2009. BMEI '09. 2nd International Conference on
Conference_Location :
Tianjin
Print_ISBN :
978-1-4244-4132-7
Electronic_ISBN :
978-1-4244-4134-1
DOI :
10.1109/BMEI.2009.5305498