DocumentCode
2197691
Title
IDDQ Test Challenges in Nanotechnologies: A Manufacturing Test Strategy
Author
Yu WeiP´ng ; Lee, Moo Kit ; Ng, Peng Weng ; Ong, Chin Hu
Author_Institution
Marvell Semicond., Sunnyvale
fYear
2007
fDate
8-11 Oct. 2007
Firstpage
211
Lastpage
211
Abstract
The implementation of IDDQ test is increasingly challenging with the shrinking of process geometry in nanotechnologies. This paper presents a case study of the test challenges that the industry is facing in deep submicron process. An IDDQ manufacturing test strategy is discussed to address the challenges.
Keywords
integrated circuit testing; leakage currents; nanoelectronics; IC manufacturing test strategy; IDDQ test challenge; integrated circuit testing; leakage current; nanotechnology; semiconductor fabrication process; submicron process; Automatic testing; Current measurement; Geometry; Leakage current; Loss measurement; Manufacturing industries; Manufacturing processes; Production; Semiconductor device manufacture; Very large scale integration;
fLanguage
English
Publisher
ieee
Conference_Titel
Asian Test Symposium, 2007. ATS '07. 16th
Conference_Location
Beijing
ISSN
1081-7735
Print_ISBN
978-0-7695-2890-8
Type
conf
DOI
10.1109/ATS.2007.36
Filename
4388011
Link To Document