Title :
Scan Diagnosis and Its Successful Industrial Applications
Author :
Yang, Wu ; Cheng, Wu-Tung ; Huang, Yu ; Keim, Martin ; Klingenberg, Randy
Author_Institution :
Mentor Graphics, Wilsonville
Abstract :
As technologies move below 130nm, the IC industry has seen a significant change in defect type encountered. Feature-related defects are becoming more prevalent than particle-driven defects in nanometer designs. The process and design variances require checks for the design-for-manufacturing (DFM) issues in order to achieve a high yield. Scan diagnosis targeted for the nanometer designs can provide quick, accurate and reliable failure information from the production environment. The ranked, fault classified and physically linked scan diagnosis results can, in turn, provide the guides for DFM checks. High volume diagnosis provides data to yield management system for statistical analysis. This presentation briefly explains the technology behind the scene, discusses scan diagnosis applications and shows the results.
Keywords :
design for manufacture; integrated circuit manufacture; statistical analysis; IC industry; design-for-manufacturing; failure information reliability; feature-related defects; industrial applications yield improvement; layout aware-volume diagnosis; nanometer designs; particle-driven defects; scan diagnosis; statistical analysis; yield management system; Application specific integrated circuits; Design for manufacture; Fitting; Foundries; Graphics; Integrated circuit testing; Layout; Statistical analysis; System testing; USA Councils;
Conference_Titel :
Asian Test Symposium, 2007. ATS '07. 16th
Conference_Location :
Beijing
Print_ISBN :
978-0-7695-2890-8
DOI :
10.1109/ATS.2007.99