• DocumentCode
    2198746
  • Title

    NOx reduction using NH/sub 3/ radical prepared by intermittent dielectric barrier discharge at atmospheric pressure

  • Author

    Nishida, M. ; Yukimura, K. ; Kambara, S. ; Maruyama, T.

  • Author_Institution
    Dept. of Electr. Eng., Doshisha Univ., Kyoto, Japan
  • fYear
    2000
  • fDate
    4-7 June 2000
  • Firstpage
    90
  • Abstract
    Summary form only given, as follows. The NOx removal was made by using the NH/sub 3/ radicals which were prepared by dielectric barrier discharge with a one-cycle sinusoidal-wave power source. The discharge was intermittently made between coaxial cylindrical electrodes with a space of about 3 mm at an applied peak-to-peak voltage of 20-45 kV in ammonia gas. The radicals were introduced to a reaction chamber 10 cm in diameter and 40 cm in length, and were mixed with heated or unheated NOx gas. The spectrum of NH radical at 336 nm was observed at the mixing zone in the reaction chamber. The NOx reduction rate was measured at a source voltage between 20 to 45 kV. The rate changed in proportion with the applied source voltage between 20 and 45 kV. The electric power deposited into the dielectric barrier discharge increased with the applied voltage. The NOx reduction was also studied by using nitrogen plasma. The reduction ratio for nitrogen plasma hit the ceiling at higher applied source voltages.
  • Keywords
    air pollution control; discharges (electric); nitrogen compounds; plasma applications; 20 to 45 kV; 336 nm; N/sub 2/ plasma reduction ratio; NH/sub 3/; NH/sub 3/ radical; NO; NOx reduction; ammonia gas; atmospheric pressure; coaxial cylindrical electrodes; electric power; intermittent dielectric barrier discharge; one-cycle sinusoidal-wave power source; Dielectrics;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Plasma Science, 2000. ICOPS 2000. IEEE Conference Record - Abstracts. The 27th IEEE International Conference on
  • Conference_Location
    New Orleans, LA, USA
  • ISSN
    0730-9244
  • Print_ISBN
    0-7803-5982-8
  • Type

    conf

  • DOI
    10.1109/PLASMA.2000.854572
  • Filename
    854572