DocumentCode :
2200324
Title :
Skin Response During Irradiation by Intense Pulsed Light Based on Optical Imaging Technology and Histology
Author :
Wu Shu-lian ; Li Hui ; Xiao Zheng-ying ; Li Zhi-fang
Author_Institution :
Key Lab. of Optoelectron. Sci. & Technol. for Med., Fujian Normal Univ., Fuzhou, China
fYear :
2009
fDate :
17-19 Oct. 2009
Firstpage :
1
Lastpage :
4
Abstract :
Nonablative light is a novel light source such as intense pulsed light (IPL) treatment for skin disease. The clinical objective of it is to maximize thermal damage to upper dermis while minimizing injury to the epidermis and to decrease potential complications. But many the complications also exist in the clinic. In this study, we developed a new approach to monitor the response of skin tissue irradiated by IPL and measured the attenuation coefficient between the change of the tissue optical properties utilizing fiber based on optical coherence tomography (OCT) technology and conventional histology. OCT is a well-established optical imaging technique that uses low coherence interferometry to produce micrometer-scale resolution images of biological media. The outcome shows that the attenuation coefficient increase after irradiated and then gradually reduces with times; the changes of the total attenuation coefficient increase with the dose.
Keywords :
bio-optics; biomedical optical imaging; biothermics; diseases; light interferometry; optical tomography; patient treatment; skin; OCT technology; attenuation coefficient; biological media; epidermal injury; histology; intense pulsed light irradiation; low coherence interferometry; optical coherence tomography; optical imaging technology; skin disease treatment; skin response; thermal damage; Biomedical optical imaging; Dermis; Diseases; Injuries; Light sources; Optical attenuators; Optical imaging; Optical interferometry; Optical pulses; Skin;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Biomedical Engineering and Informatics, 2009. BMEI '09. 2nd International Conference on
Conference_Location :
Tianjin
Print_ISBN :
978-1-4244-4132-7
Electronic_ISBN :
978-1-4244-4134-1
Type :
conf
DOI :
10.1109/BMEI.2009.5305767
Filename :
5305767
Link To Document :
بازگشت