DocumentCode
2200508
Title
Modeling of the plasma heating in unmagnetized low pressure microwave discharges
Author
Grotjohn, Timothy A.
Author_Institution
Michigan State Univ., East Lansing, MI, USA
fYear
2000
fDate
4-7 June 2000
Firstpage
102
Abstract
Summary form only given. Low pressure microwave plasma sources used for materials processing generally operate as overdense plasmas with the plasma density greater than the critical density. These sources can be operated with a static magnetic field that provides for ECR heating or without a static magnetic field via ohmic, resonance and other non-ohmic and stochastic heating mechanisms. Even when ECR strength magnetic fields are present these other heating mechanism that occur in unmagnetized plasmas can be important and may even dominate. This paper examines via a two-dimensional self-consistent microwave field and plasma model the heating of low pressure, overdense, unmagnetized plasma discharges. Further the models are constructed to closely match an experimental system that has been extensively characterized. This experimental system is a 2.45 GHz resonant cavity plasma source that has been studied while running argon discharges at pressures of 4-60 mTorr using Langmuir probes to determine the plasma density and electron temperature and using microwave field probes to measure the microwave field strength.
Keywords
Langmuir probes; high-frequency discharges; plasma density; plasma heating; plasma ohmic heating; plasma radiofrequency heating; plasma temperature; ECR heating; ECR strength magnetic fields; Langmuir probes; critical density; electron temperature; materials processing; microwave field probes; microwave field strength; nonohmic heating; ohmic heating; overdense plasmas; plasma density; plasma heating; plasma model; resonance heating; resonant cavity plasma; running Ar discharges; static magnetic field; stochastic heating; two-dimensional self-consistent microwave field; unmagnetized low pressure microwave discharges; unmagnetized plasmas; Argon; Electromagnetic heating; Fault location; Magnetic fields; Magnetic resonance; Plasma density; Plasma materials processing; Plasma sources; Probes; Stochastic resonance;
fLanguage
English
Publisher
ieee
Conference_Titel
Plasma Science, 2000. ICOPS 2000. IEEE Conference Record - Abstracts. The 27th IEEE International Conference on
Conference_Location
New Orleans, LA, USA
ISSN
0730-9244
Print_ISBN
0-7803-5982-8
Type
conf
DOI
10.1109/PLASMA.2000.854653
Filename
854653
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