• DocumentCode
    2200957
  • Title

    Energy transfer phenomena between reactant and fluent gases in PACT (Plasma Assisted Catalytic Technology) chemical reactor

  • Author

    Hayashi, Yasuhiro ; Matsumoto, Hirokazu ; Irie, Kazuki ; Yamauchi, Genki

  • Author_Institution
    Japan Fine Ceramics Center, Nagoya, Japan
  • fYear
    2000
  • fDate
    4-7 June 2000
  • Firstpage
    106
  • Abstract
    Summary form only given. New chemical reactor named "PACT" is proposed, whose concept is based on the synergic effect of Plasma and Catalyst. Non-equilibrium plasma can be formed between electrodes with coated catalytic material, including photo-catalytic material like TiO/sub 2/, at room temperature and one atmosphere. We used "Tube Type PACT" based on the above concept, whose plasma may be a Silent Discharge Plasma because a glass layer exists between the electrodes. Applied electrical conditions are as follows; wave form (Sine wave), voltage (>5 kV/sub ac/), frequency (0.01/spl sim/10 kHz). Some chemical reactions like the decompositions of NO/sub x/ and CO/sub 2/ and the reforming of CH/sub 4/ were carried out. Test conditions were checked and monitored with GC-MS, NO/sub x/ meter and CCD analysis system. We found some tendencies related to the synergic effect between plasma and catalyst, and the energy transfer phenomena between reactant and flowing gases, especially in the case of CH/sub 4/ in Ar.
  • Keywords
    catalysis; chemical reactions; chemical technology; 0.1 to 10 kHz; 5 kV; CCD analysis system; CH/sub 4/ reforming; CO/sub 2/; GC-MS; NO; NO/sub x/ depositions; NO/sub x/ meter; PACT; PACT type tube; TiO/sub 2/; applied electrical conditions; chemical reaction; coated catalytic material; effluent; energy transfer phenomena; flowing gases; fluent gases; frequency; nonequilibrium plasma; photocatalytic material; plasma assisted catalytic technology chemical reactor; reactant; silent discharge plasma; synergic effect; voltage; wave form; Atmosphere; Chemical reactors; Electrodes; Energy exchange; Gases; Glass; Plasma chemistry; Plasma materials processing; Plasma temperature; Plasma waves;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Plasma Science, 2000. ICOPS 2000. IEEE Conference Record - Abstracts. The 27th IEEE International Conference on
  • Conference_Location
    New Orleans, LA, USA
  • ISSN
    0730-9244
  • Print_ISBN
    0-7803-5982-8
  • Type

    conf

  • DOI
    10.1109/PLASMA.2000.854676
  • Filename
    854676