DocumentCode
2201125
Title
Influence of excitation and geometrical parameters on the VUV radiation of a pure xenon dielectric barrier discharge
Author
Sewraj, N. ; Bordage, M.C. ; Zissis, Georges
Author_Institution
Centre de Phys. des Plasmas et de Leurs Appl. de Toulouse, Univ. Paul Sabatier, Toulouse, France
fYear
2000
fDate
4-7 June 2000
Firstpage
107
Abstract
Summary form only given. Environmental pollution greatly threatens our life quality and so incites both "law-makers" and scientists to improve existing depollution techniques or even to seek for new ones. Comparing to existing water decontamination processes from volatile organic compounds (VOC), the use of vacuum ultraviolet (VUV) radiation from dielectric barrier discharge (DBD) seems to be most suitable: VUV radiation from excimer is emitted with a high efficiency in narrow band continua, VUV photodegradation of VOC micropolluants is efficient even for very small concentrations. Furthermore, DBD is cheap, versatile, handy and can easily be adapted to any geometrical form of photochemical reactors. Its output radiation can be "controlled" by means of external parameters such as excitation voltage waveform, interelectrode distance, and gas filling nature and gas composition. Our purpose is to study in what extent these parameters influence the output VUV radiation in order to optimize such a water decontamination technique. For that a good knowledge of the spatial and temporal kinetic schemes of the excimer formation and decay is required. We chose both an experimental and modelling approach.
Keywords
discharges (electric); organic compounds; plasma applications; water pollution control; xenon; VUV photodegradation; VUV radiation; Xe; Xe dielectric barrier discharge; depollution techniques; environmental pollution; excimer formation; excitation; excitation voltage waveform; experimental approach; gas composition; gas filling; geometrical parameters; interelectrode distance; modelling approach; narrow band continua; photochemical reactors; temporal kinetic schemes; vacuum ultraviolet radiation; volatile organic compounds; water decontamination; Decontamination; Dielectrics; Filling; Inductors; Kinetic theory; Narrowband; Photochemistry; Volatile organic compounds; Voltage; Water pollution;
fLanguage
English
Publisher
ieee
Conference_Titel
Plasma Science, 2000. ICOPS 2000. IEEE Conference Record - Abstracts. The 27th IEEE International Conference on
Conference_Location
New Orleans, LA, USA
ISSN
0730-9244
Print_ISBN
0-7803-5982-8
Type
conf
DOI
10.1109/PLASMA.2000.854681
Filename
854681
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