• DocumentCode
    2201125
  • Title

    Influence of excitation and geometrical parameters on the VUV radiation of a pure xenon dielectric barrier discharge

  • Author

    Sewraj, N. ; Bordage, M.C. ; Zissis, Georges

  • Author_Institution
    Centre de Phys. des Plasmas et de Leurs Appl. de Toulouse, Univ. Paul Sabatier, Toulouse, France
  • fYear
    2000
  • fDate
    4-7 June 2000
  • Firstpage
    107
  • Abstract
    Summary form only given. Environmental pollution greatly threatens our life quality and so incites both "law-makers" and scientists to improve existing depollution techniques or even to seek for new ones. Comparing to existing water decontamination processes from volatile organic compounds (VOC), the use of vacuum ultraviolet (VUV) radiation from dielectric barrier discharge (DBD) seems to be most suitable: VUV radiation from excimer is emitted with a high efficiency in narrow band continua, VUV photodegradation of VOC micropolluants is efficient even for very small concentrations. Furthermore, DBD is cheap, versatile, handy and can easily be adapted to any geometrical form of photochemical reactors. Its output radiation can be "controlled" by means of external parameters such as excitation voltage waveform, interelectrode distance, and gas filling nature and gas composition. Our purpose is to study in what extent these parameters influence the output VUV radiation in order to optimize such a water decontamination technique. For that a good knowledge of the spatial and temporal kinetic schemes of the excimer formation and decay is required. We chose both an experimental and modelling approach.
  • Keywords
    discharges (electric); organic compounds; plasma applications; water pollution control; xenon; VUV photodegradation; VUV radiation; Xe; Xe dielectric barrier discharge; depollution techniques; environmental pollution; excimer formation; excitation; excitation voltage waveform; experimental approach; gas composition; gas filling; geometrical parameters; interelectrode distance; modelling approach; narrow band continua; photochemical reactors; temporal kinetic schemes; vacuum ultraviolet radiation; volatile organic compounds; water decontamination; Decontamination; Dielectrics; Filling; Inductors; Kinetic theory; Narrowband; Photochemistry; Volatile organic compounds; Voltage; Water pollution;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Plasma Science, 2000. ICOPS 2000. IEEE Conference Record - Abstracts. The 27th IEEE International Conference on
  • Conference_Location
    New Orleans, LA, USA
  • ISSN
    0730-9244
  • Print_ISBN
    0-7803-5982-8
  • Type

    conf

  • DOI
    10.1109/PLASMA.2000.854681
  • Filename
    854681