DocumentCode
2201513
Title
Effects related to dose deposition profiles in integrated optics structures
Author
West, R.H. ; Dowling, S.
Author_Institution
R. Mil. Coll. of Sci., Shrivenham, UK
fYear
1995
fDate
18-22 Sep 1995
Firstpage
519
Lastpage
524
Abstract
Results from exposures of lithium tantalate and lithium niobate integrated optic structures to pulses of high energy X-rays and fast electrons are related to dose and charge deposition profiles. Anomalous effects in the tantalate are ascribed to induced electric fields
Keywords
X-ray effects; electron beam effects; integrated optics; lithium compounds; optical losses; LiNbO3; LiTaO3; charge deposition profiles; dose deposition profiles; fast electrons; high energy X-rays; induced electric fields; integrated optics structures; Electron optics; Integrated optics; Lithium niobate; Optical losses; Optical materials; Optical refraction; Optical scattering; Optical variables control; Optical waveguides; X-rays;
fLanguage
English
Publisher
ieee
Conference_Titel
Radiation and its Effects on Components and Systems, 1995. RADECS 95., Third European Conference on
Conference_Location
Arcachon
Print_ISBN
0-7803-3093-5
Type
conf
DOI
10.1109/RADECS.1995.509831
Filename
509831
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