DocumentCode :
2202347
Title :
A molecular beam mass spectrometer for plasma jet chemical vapor deposition reactor diagnostics
Author :
Kull, A.E. ; Cappelli, M.A.
Author_Institution :
Dept. of Mech. Eng., Stanford Univ., CA, USA
fYear :
2000
fDate :
4-7 June 2000
Firstpage :
120
Abstract :
Summary form only given. Direct current (DC) plasma jets (also known as arcjets) are a particular form of high density, low pressure plasma source that produce a high velocity (5-10 km/sec) plasma stream (20-30% dissociation fraction, n/sub e/-10/sup 13/ cm/sup -3/) with low energy ions (∼1 eV). The plasma jet provides large convective fluxes of chemically reactive radical species, in super-equilibrium concentrations, that can be used for materials deposition, reactive etching, and plasma cleaning. To elucidate the kinetics of these processes, it is necessary to identify key radical species and measure their populations. For this task, molecular beam mass spectrometry is employed. A sample of the plasma jet plume is taken through a hole in the substrate on which the flowing plasma stagnates. A differentially pumped molecular beam forming system ensures that the sample is representative of the plasma chemistry. The symmetry of the plasma jet plume allows spatial maps to be made of the reactive species impinging on the substrate. Results are presented for a representative plasma jet process.
Keywords :
mass spectra; molecular beams; plasma CVD; plasma diagnostics; plasma jets; plasma-beam interactions; 1 eV; 5 to 10 km/s; DC plasma jets; arcjets; chemically reactive radical species; convective fluxes; differentially pumped molecular beam forming system; dissociation fraction; flowing plasma stagnation; high density low pressure plasma source; high velocity plasma stream; low energy ions; materials deposition; molecular beam mass spectrometer; plasma chemistry; plasma cleaning; plasma jet; plasma jet chemical vapor deposition reactor diagnostics; plasma jet plume; plasma jet process; plasma process kinetics; reactive etching; reactive species; spatial maps; substrate; super-equilibrium concentrations; symmetry; Chemicals; Cleaning; Etching; Mass spectroscopy; Plasma applications; Plasma chemistry; Plasma density; Plasma materials processing; Plasma measurements; Plasma sources;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Plasma Science, 2000. ICOPS 2000. IEEE Conference Record - Abstracts. The 27th IEEE International Conference on
Conference_Location :
New Orleans, LA, USA
ISSN :
0730-9244
Print_ISBN :
0-7803-5982-8
Type :
conf
DOI :
10.1109/PLASMA.2000.854738
Filename :
854738
Link To Document :
بازگشت