Title :
Characterization of the ACE 4 catcher´s mitt POS-load configuration
Author :
Thompson, James R. ; Coleman, P.L. ; Crumley, R.J. ; Goodrich, P.J. ; Goyer, J.R. ; Parks, D.E. ; Rauch, J.E. ; Steen, P. ; Waisman, E.M. ; Maron, Yitzhak ; Moschella, J.J.
Author_Institution :
Maxwell Physics Int., San Diego, CA, USA
Abstract :
Summary form only given. A growing body of evidence suggests that the performance of a high density plasma opening switch (POS), driving a bremsstrahlung load, is controlled by low levels of plasma downstream from the POS. We discuss here the "Catcher\´s Mitt" configuration demonstrated on ACE 4 at current levels approaching 4 MA and for conduction times exceeding 1 /spl mu/s, as an approach to controlling downstream plasma in high I/sub c/*T/sub c/, POS. Under these conditions the ACE 4 POS demonstrated an open impedance greater than 0.5 /spl Omega/ and generated in excess of 1 MV when driving a pinched e-beam load. The Catcher\´s Mitt geometry was based on a phenomenological model which was developed to explain experimental observations on ACE 4. Optimization and the application of this approach to other pulsed power machines requires a more basic physics understanding of the interaction between the POS and the downstream Catcher\´s Mitt geometry. This paper reports on recent tests and analyses aimed at achieving that basic understanding.
Keywords :
plasma density; plasma switches; pulsed power technology; 0.5 ohm; 1 MV; 4 MA; ACE 4 catcher´s mitt POS-load configuration; Catcher´s Mitt configuration; bremsstrahlung load; conduction times; current levels; downstream Catcher´s Mitt geometry; downstream plasma; high density plasma opening switch; open impedance; optimization; phenomenological model; pinched e-beam load; pulsed power machines; Geometry; Impedance; Physics; Plasma density; Solid modeling; Switches; Testing;
Conference_Titel :
Plasma Science, 2000. ICOPS 2000. IEEE Conference Record - Abstracts. The 27th IEEE International Conference on
Conference_Location :
New Orleans, LA, USA
Print_ISBN :
0-7803-5982-8
DOI :
10.1109/PLASMA.2000.854779