DocumentCode :
2203711
Title :
Optical measurements of the properties of exploding wires
Author :
Kusse, B.R. ; Min Hu ; Pikuz, S.A. ; Sinars, D.B. ; Chandler, K.M. ; Greenly, J.B. ; Hammer, D.A. ; Shelkovenko, T.A.
Author_Institution :
Lab. of Plasma Studies, Cornell Univ., Ithaca, NY, USA
fYear :
2000
fDate :
4-7 June 2000
Firstpage :
139
Abstract :
Summary form only given. The explosions of fine wires driven by a pulsed current source with a rise rate of 10/sup 10/ A/s per wire were observed with optical diagnostics using a Nd:YAG laser [λ=532 nm, 4 ns]. Three simultaneous schlieren channels and two interferometry channels separated by 50 ns were used. The schlieren channels consist of a bright-field iris, a dark field strip and a dark-field knife-edge. The interferometry was performed using a new version of a shearing interferometer, which is based on a double-prism with an air wedge. The expansion rates of various materials (Cu, Ag, Au, etc.) both with and without thin insulating coatings were measured. A strong effect of the insulation coating on wire expansion was observed for all those materials (Sinars et al., 2000). The interferometry images showed a plasma shell surrounding an expanding neutral vapor column. From these measurements we obtained the refractive index of the exploding wire vapor/plasma and used these results to find values for the plasma electron and neutral vapor densities.
Keywords :
exploding wires; light interferometry; plasma diagnostics; refractive index; 4 ns; 532 nm; air wedge; bright-field iris; dark field strip; dark-field knife-edge; double-prism; expanding neutral vapor column; expansion rates; exploding wire vapor/plasma; exploding wires; fine wires; interferometry channels; interferometry images; neutral vapor density; optical diagnostics; optical measurements; plasma electron density; plasma shell; pulsed current source; refractive index; rise rate; schlieren channels; shearing interferometer; thin insulating coatings; Coatings; Explosions; Optical interferometry; Optical pulses; Optical refraction; Optical variables control; Plasma density; Plasma materials processing; Plasma measurements; Wire;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Plasma Science, 2000. ICOPS 2000. IEEE Conference Record - Abstracts. The 27th IEEE International Conference on
Conference_Location :
New Orleans, LA, USA
ISSN :
0730-9244
Print_ISBN :
0-7803-5982-8
Type :
conf
DOI :
10.1109/PLASMA.2000.854795
Filename :
854795
Link To Document :
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