• DocumentCode
    2203711
  • Title

    Optical measurements of the properties of exploding wires

  • Author

    Kusse, B.R. ; Min Hu ; Pikuz, S.A. ; Sinars, D.B. ; Chandler, K.M. ; Greenly, J.B. ; Hammer, D.A. ; Shelkovenko, T.A.

  • Author_Institution
    Lab. of Plasma Studies, Cornell Univ., Ithaca, NY, USA
  • fYear
    2000
  • fDate
    4-7 June 2000
  • Firstpage
    139
  • Abstract
    Summary form only given. The explosions of fine wires driven by a pulsed current source with a rise rate of 10/sup 10/ A/s per wire were observed with optical diagnostics using a Nd:YAG laser [λ=532 nm, 4 ns]. Three simultaneous schlieren channels and two interferometry channels separated by 50 ns were used. The schlieren channels consist of a bright-field iris, a dark field strip and a dark-field knife-edge. The interferometry was performed using a new version of a shearing interferometer, which is based on a double-prism with an air wedge. The expansion rates of various materials (Cu, Ag, Au, etc.) both with and without thin insulating coatings were measured. A strong effect of the insulation coating on wire expansion was observed for all those materials (Sinars et al., 2000). The interferometry images showed a plasma shell surrounding an expanding neutral vapor column. From these measurements we obtained the refractive index of the exploding wire vapor/plasma and used these results to find values for the plasma electron and neutral vapor densities.
  • Keywords
    exploding wires; light interferometry; plasma diagnostics; refractive index; 4 ns; 532 nm; air wedge; bright-field iris; dark field strip; dark-field knife-edge; double-prism; expanding neutral vapor column; expansion rates; exploding wire vapor/plasma; exploding wires; fine wires; interferometry channels; interferometry images; neutral vapor density; optical diagnostics; optical measurements; plasma electron density; plasma shell; pulsed current source; refractive index; rise rate; schlieren channels; shearing interferometer; thin insulating coatings; Coatings; Explosions; Optical interferometry; Optical pulses; Optical refraction; Optical variables control; Plasma density; Plasma materials processing; Plasma measurements; Wire;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Plasma Science, 2000. ICOPS 2000. IEEE Conference Record - Abstracts. The 27th IEEE International Conference on
  • Conference_Location
    New Orleans, LA, USA
  • ISSN
    0730-9244
  • Print_ISBN
    0-7803-5982-8
  • Type

    conf

  • DOI
    10.1109/PLASMA.2000.854795
  • Filename
    854795