• DocumentCode
    2204044
  • Title

    Current conduction paths in GaN

  • Author

    Morkoç, Hadis ; Bask, A.A. ; Molnar, R. ; Jasinski, J. ; Weber, Z. Liliental

  • Author_Institution
    Virginia Commonwealth Univ., Richmond, VA, USA
  • fYear
    2003
  • fDate
    25-27 Aug. 2003
  • Firstpage
    100
  • Lastpage
    101
  • Abstract
    Studies current conduction using C-AFM on a variety of GaN samples grown by MBE and HVPE on sapphire, both before and after performing chemical etches to delineate defect structures. Samples employed both side ohmic contacts and a conventional Schottky barrier configuration. The results indicate that the major current conduction paths in forward direction below the threshold of the metal-semiconductor junction turn-on are associated with prismatic planes. The same is true for the reverse current case. The Schottky barrier experiments indicate the planarized surfaces exhibit much lower excess current.
  • Keywords
    III-V semiconductors; Schottky barriers; atomic force microscopy; electrical conductivity; etching; gallium compounds; ohmic contacts; semiconductor epitaxial layers; semiconductor-metal boundaries; surface roughness; wide band gap semiconductors; AFM; Al2O3; GaN; GaN sample; MBE; Schottky barrier; chemical etching; current conduction path; delineate defect structure; metal-semiconductor junction; ohmic contact; planarized surface current; sapphire; Atomic force microscopy; Chemicals; Conductivity; Etching; Fasteners; Gallium nitride; Molecular beam epitaxial growth; Rough surfaces; Schottky barriers; Surface roughness;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Compound Semiconductors, 2003. International Symposium on
  • Print_ISBN
    0-7803-7820-2
  • Type

    conf

  • DOI
    10.1109/ISCS.2003.1239925
  • Filename
    1239925