DocumentCode
2204084
Title
Electron injection in III-nitride semiconductors
Author
Chernyak, Leonid
Author_Institution
Dept. of Phys., Central Florida Univ., Orlando, FL, USA
fYear
2003
fDate
25-27 Aug. 2003
Firstpage
104
Lastpage
105
Abstract
In this paper, it is found that electron injection into p-(Al)GaN-either from the electron beams of Scanning Electron Microscope (SEM) or from the application of an external voltage in a solid state device-increase the critical minority carrier diffusion length and lifetime. Consistent changes were observed in the material,s optoelectronic properties, including photoresponse (2), and were attributed to charging of deep metastable Mg dopant related centers. The novel effects, induced by electron injection in III-Nitrides, and the ways to exploit them for tailoring the material,s fundamental properties will be discussed. Application of the effects for performance improvement of photovoltaic UV detectors will be demonstrated.
Keywords
III-V semiconductors; carrier lifetime; gallium compounds; minority carriers; photoconductivity; photodetectors; scanning electron microscopy; semiconductor epitaxial layers; wide band gap semiconductors; GaN; Mg dopant; electron injection; group III nitride semiconductor; minority carrier diffusion length; minority carrier lifetime; optoelectronic properties; photoresponse; scanning electron microscopy; solid state device; Absorption; Electron beams; Gallium nitride; PIN photodiodes; Photodetectors; Photovoltaic systems; Physics; Scanning electron microscopy; Solar power generation; Temperature dependence;
fLanguage
English
Publisher
ieee
Conference_Titel
Compound Semiconductors, 2003. International Symposium on
Print_ISBN
0-7803-7820-2
Type
conf
DOI
10.1109/ISCS.2003.1239927
Filename
1239927
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