• DocumentCode
    2204084
  • Title

    Electron injection in III-nitride semiconductors

  • Author

    Chernyak, Leonid

  • Author_Institution
    Dept. of Phys., Central Florida Univ., Orlando, FL, USA
  • fYear
    2003
  • fDate
    25-27 Aug. 2003
  • Firstpage
    104
  • Lastpage
    105
  • Abstract
    In this paper, it is found that electron injection into p-(Al)GaN-either from the electron beams of Scanning Electron Microscope (SEM) or from the application of an external voltage in a solid state device-increase the critical minority carrier diffusion length and lifetime. Consistent changes were observed in the material,s optoelectronic properties, including photoresponse (2), and were attributed to charging of deep metastable Mg dopant related centers. The novel effects, induced by electron injection in III-Nitrides, and the ways to exploit them for tailoring the material,s fundamental properties will be discussed. Application of the effects for performance improvement of photovoltaic UV detectors will be demonstrated.
  • Keywords
    III-V semiconductors; carrier lifetime; gallium compounds; minority carriers; photoconductivity; photodetectors; scanning electron microscopy; semiconductor epitaxial layers; wide band gap semiconductors; GaN; Mg dopant; electron injection; group III nitride semiconductor; minority carrier diffusion length; minority carrier lifetime; optoelectronic properties; photoresponse; scanning electron microscopy; solid state device; Absorption; Electron beams; Gallium nitride; PIN photodiodes; Photodetectors; Photovoltaic systems; Physics; Scanning electron microscopy; Solar power generation; Temperature dependence;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Compound Semiconductors, 2003. International Symposium on
  • Print_ISBN
    0-7803-7820-2
  • Type

    conf

  • DOI
    10.1109/ISCS.2003.1239927
  • Filename
    1239927