Title :
Theoretical overview of the large area plasma processing system (LAPPS)
Author :
Manheimer, W.M. ; Fernsler, R. ; Lampe, M. ; Meger, R.
Author_Institution :
Naval Res. Lab., Washington, DC, USA
Abstract :
Summary form only given. An initial theoretical study of LAPPS has focused on plasma and free radical production, ion fluxes to substrates, uniformity of the plasma and flux for insulating and conducting substrates, as well as DC and RF sheaths. This theoretical work has been used to analyze several initial experiments on isotropic etching, ion fluxes to conducting substrates, and measurements of electron temperature.
Keywords :
plasma diagnostics; plasma materials processing; plasma production; plasma sheaths; plasma temperature; substrates; DC sheaths; RF sheaths; conducting substrates; electron temperature; free radical production; insulating substrates; ion fluxes; isotropic etching; large area plasma processing system; plasma production; uniformity; Etching; Insulation; Plasma applications; Plasma materials processing; Plasma measurements; Plasma sheaths; Plasma temperature; Production; Radio frequency; Temperature measurement;
Conference_Titel :
Plasma Science, 2000. ICOPS 2000. IEEE Conference Record - Abstracts. The 27th IEEE International Conference on
Conference_Location :
New Orleans, LA, USA
Print_ISBN :
0-7803-5982-8
DOI :
10.1109/PLASMA.2000.854829
