Title :
Large scale manufacturing challenges of bipolar/BiCMOS processes in CMOS production lines
Author :
Verma, P.R. ; Chu, Sanford ; Shafi, Alan ; Lim, Simon ; Yong, Khoo ; Huat, Yeo Chak
Author_Institution :
Chartered Semicond. Manuf Ltd., Singapore, Singapore
Abstract :
Real life large scale manufacturing issues of BiCMOS processes in heavily loaded CMOS based manufacturing ne have been evaluated & has been found that CMOS manufactures have to significantly improve their inline process controls & cross-contamination beyond the CMOS requirements for process manufacturability. Especially high current implants, polysilicon deposition & emitter drives etc. require relatively higher emphasis in equipment matching & improved controls. The paper emphasizes on some of the key manufacturability problems encountered & the solutions
Keywords :
BiCMOS integrated circuits; integrated circuit manufacture; ion implantation; BiCMOS processes; CMOS production lines; base resistance; cross-contamination; design rules; emitter drives; equipment matching; high current implants; high speed bipolar products; inline process controls; large scale manufacturing challenges; polysilicon deposition; process manufacturability; secondary problems; BiCMOS integrated circuits; CMOS process; CMOS technology; Capacitors; Large-scale systems; Manufacturing processes; Process control; Production; Pulp manufacturing; Semiconductor device manufacture;
Conference_Titel :
Solid-State and Integrated-Circuit Technology, 2001. Proceedings. 6th International Conference on
Conference_Location :
Shanghai
Print_ISBN :
0-7803-6520-8
DOI :
10.1109/ICSICT.2001.981428
