Large scale manufacturing challenges of bipolar/BiCMOS processes in CMOS production lines

Author

Verma, P.R. ; Chu, Sanford ; Shafi, Alan ; Lim, Simon ; Yong, Khoo ; Huat, Yeo Chak

Author_Institution

Chartered Semicond. Manuf Ltd., Singapore, Singapore

Volume

1

fYear

2001

fDate

2001

Firstpage

75

Abstract

Real life large scale manufacturing issues of BiCMOS processes in heavily loaded CMOS based manufacturing ne have been evaluated & has been found that CMOS manufactures have to significantly improve their inline process controls & cross-contamination beyond the CMOS requirements for process manufacturability. Especially high current implants, polysilicon deposition & emitter drives etc. require relatively higher emphasis in equipment matching & improved controls. The paper emphasizes on some of the key manufacturability problems encountered & the solutions

Keywords

BiCMOS integrated circuits; integrated circuit manufacture; ion implantation; BiCMOS processes; CMOS production lines; base resistance; cross-contamination; design rules; emitter drives; equipment matching; high current implants; high speed bipolar products; inline process controls; large scale manufacturing challenges; polysilicon deposition; process manufacturability; secondary problems; BiCMOS integrated circuits; CMOS process; CMOS technology; Capacitors; Large-scale systems; Manufacturing processes; Process control; Production; Pulp manufacturing; Semiconductor device manufacture;

fLanguage

English

Publisher

ieee

Conference_Titel

Solid-State and Integrated-Circuit Technology, 2001. Proceedings. 6th International Conference on

Conference_Location

Shanghai

Print_ISBN

0-7803-6520-8

Type

conf

DOI

10.1109/ICSICT.2001.981428

Filename

981428