• DocumentCode
    2204606
  • Title

    Triggerless shunting arc generation and pulsed ion extraction

  • Author

    Yukimura, Ken ; Tani, Yuta ; Yoshioka, Kazuaki ; Masamune, S.

  • Author_Institution
    Dept. of Electr. Eng., Doshisha Univ., Kyoto, Japan
  • fYear
    2000
  • fDate
    4-7 June 2000
  • Firstpage
    153
  • Abstract
    Summary form only given. Shunting discharge is an alternating capacitor discharge through a rod of solid-state materials. Optimization of the discharge condition has realized self-ignition of the arc discharge with low input power to the rod, leading to a much longer rod life time than in conventional shunting arc or peripheral arc. The shunting-arc-produced plasma contains mainly the ions of the solid-state material, and ion extraction from the plasma has also been demonstrated. Thus, the shunting arc works as a pulsed ion source for solid-state materials for plasma-based ion implantation (PBII) and ion processing. This article describes the characteristics of pulsed carbon shunting arc, using coaxial electrodes. The shunting arc current showed a damping oscillation with a peak current of 4.0 kA at 15 /spl mu/s, for the circuit parameters in the present experiment. Hesitations of arc ignition for some 2-3 /spl mu/s accompanied by voltage jump was observed at the beginning of each half cycle, which is an indication that an increase in carbon vapor pressure or emission of thermoelectrons around the rods due to rod heating is a basic requirement for the arc ignition.
  • Keywords
    arcs (electric); ion implantation; plasma materials processing; 4.0 kA; 5 kV; C vapor pressure; alternating capacitor discharge; arc discharge self-ignition; arc ignition; circuit parameters; coaxial electrodes; damping oscillation; discharge condition optimization; ion extraction; ion processing; plasma-based ion implantation; pulsed ion extraction; pulsed ion source; rod heating; shunting discharge; solid-state material; solid-state materials; thermoelectrons emission; triggerless shunting arc generation; Arc discharges; Capacitors; Ignition; Ion sources; Plasma immersion ion implantation; Plasma materials processing; Plasma properties; Plasma sources; Pulse generation; Solid state circuits;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Plasma Science, 2000. ICOPS 2000. IEEE Conference Record - Abstracts. The 27th IEEE International Conference on
  • Conference_Location
    New Orleans, LA, USA
  • ISSN
    0730-9244
  • Print_ISBN
    0-7803-5982-8
  • Type

    conf

  • DOI
    10.1109/PLASMA.2000.854834
  • Filename
    854834