DocumentCode
2204656
Title
Comparison of circular TM/sub 01/ and TM/sub 11/ modes generated electron cyclotron resonance microwave discharges-a Monte Carlo simulation study
Author
Kuo, S.S.
Author_Institution
TRW Antenna Products Center, Redondo Beach, CA, USA
fYear
2000
fDate
4-7 June 2000
Firstpage
155
Abstract
Summary form only given. Plasma density, ionization percentage, and electron energy distribution (EED) are the concerning factors of plasma sources for various industrial applications. It has been shown experimentally that the electron cyclotron resonance (ECR); plasma can be generated in low background pressure conditions and has high plasma density. The numerical simulation further indicates that the EED of an ECR plasma has a high energy tail, and can be characterized by two temperature components. In this study, the electron behavior in two ECR microwave discharges maintained, respectively, by the TM/sub 01/ and TM/sub 11/ mode fields of a cylindrical waveguide have been investigated via Monte Carlo simulations. Since ECR microwave discharge has high degree of ionization (>1%), a self-consistent simulation of the plasma dynamics is achieved through the use of the ponderomotive and grad-B forces. Accumulation of negative charges on the boundary surface sets up a sheath whose influence is also taken into account. The time averaged, spatially dependent EED is computed self-consistently by integrating electron trajectories subjected to the microwave fields, the divergent background magnetic field, the space charge field, and the sheath field, and taking into account electron-electron collisions and collisions with the neutral hydrogen atoms.
Keywords
Monte Carlo methods; high-frequency discharges; plasma density; plasma production; plasma simulation; Monte Carlo simulation study; boundary surface; circular TM/sub 01/ modes; circular TM/sub 11/ modes; cylindrical waveguide; divergent background magnetic field; electron behavior; electron cyclotron resonance microwave discharges; electron energy distribution; electron trajectories; electron-electron collisions; grad-B forces; high energy tail; industrial applications; ionization percentage; low background pressure conditions; microwave fields; negative charges accumulation; neutral H atoms; numerical simulation; plasma density; plasma dynamics; plasma sources; ponderomotive forces; self-consistent computation; self-consistent simulation; sheath field; space charge field; temperature components; Cyclotrons; Electrons; Ionization; Plasma applications; Plasma density; Plasma simulation; Plasma sources; Plasma temperature; Plasma waves; Resonance;
fLanguage
English
Publisher
ieee
Conference_Titel
Plasma Science, 2000. ICOPS 2000. IEEE Conference Record - Abstracts. The 27th IEEE International Conference on
Conference_Location
New Orleans, LA, USA
ISSN
0730-9244
Print_ISBN
0-7803-5982-8
Type
conf
DOI
10.1109/PLASMA.2000.854836
Filename
854836
Link To Document