DocumentCode
2204679
Title
PECVD Silicon Carbide Waveguides for Multichannel Sensors
Author
Pandraud, G. ; French, P.J. ; Sarro, P.M.
Author_Institution
Delft Univ. of Technol., Delft
fYear
2007
fDate
28-31 Oct. 2007
Firstpage
395
Lastpage
398
Abstract
This work presents the characteristics of an evanescent wave sensing system based on Plasma Enhanced Chemical Vapour Deposition (PECVD) Silicon Carbide (SiC) waveguides. Thin SiC films have been deposited onto Si substrates with a SiO2 film acting as a cladding layer around the carbide core. In the sensor, the evanescent tale of the light traveling in a waveguide senses an absorbant medium placed above the waveguide. By using a 1times2 power splitter the sensor is calibrated using one arm as a reference. We show that the sensitivity of such a SiC sensor is improved, compared to Silicon Nitride (SiN) sensor. Further SiC waveguides are used in 1XN optical power splitters making the platform suitable for multiple readout and multichannel sensors.
Keywords
fibre optic sensors; optical fibre cladding; plasma CVD; silicon compounds; PECVD; SiC; SiO2; cladding layer; evanescent tale; evanescent wave sensing; light traveling; multichannel sensors; silicon carbide waveguides; Chemical sensors; Chemical vapor deposition; Optical sensors; Optical waveguides; Plasma chemistry; Plasma properties; Plasma waves; Semiconductor films; Sensor phenomena and characterization; Silicon carbide;
fLanguage
English
Publisher
ieee
Conference_Titel
Sensors, 2007 IEEE
Conference_Location
Atlanta, GA
ISSN
1930-0395
Print_ISBN
978-1-4244-1261-7
Electronic_ISBN
1930-0395
Type
conf
DOI
10.1109/ICSENS.2007.4388419
Filename
4388419
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