DocumentCode :
2205044
Title :
Deposition and X-ray photoelectron spectroscopy studies on sputtered cerium dioxide thin films
Author :
Sundaram, K.B. ; Wahid, P.F. ; Melendez, O.
Author_Institution :
Dept. of Electr. Eng. & Commun. Sci., Univ. of Central Florida, Orlando, FL, USA
fYear :
1996
fDate :
11-14 Apr 1996
Firstpage :
677
Lastpage :
679
Abstract :
Cerium dioxide is a rare earth oxide material which may be useful for various optical and electronic applications because of its high refractive index and dielectric constant. Cerium dioxide thin films were deposited on to glass substrates using r.f. magnetron sputtering. A cerium dioxide target was used for sputtering and films were deposited for various oxygen-argon gas flow ratios under different sputtering power levels. X-ray photoelectron spectroscopy analysis were performed on these films and the results are presented in terms of deposition conditions
Keywords :
X-ray photoelectron spectra; binding energy; cerium compounds; optical films; photoemission; sputter deposition; CeO2; CeO2 thin films; RF magnetron sputtering; X-ray photoelectron spectroscopy; binding energies; deposition conditions; dielectric constant; electronic applications; glass substrates; optical applications; rare earth oxide material; refractive index; sputter deposition; sputtering power levels; Cerium; Dielectric materials; Magnetic materials; Optical films; Optical materials; Optical refraction; Optical variables control; Refractive index; Spectroscopy; Sputtering;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Southeastcon '96. Bringing Together Education, Science and Technology., Proceedings of the IEEE
Conference_Location :
Tampa, FL
Print_ISBN :
0-7803-3088-9
Type :
conf
DOI :
10.1109/SECON.1996.510156
Filename :
510156
Link To Document :
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