Deposition and X-ray photoelectron spectroscopy studies on sputtered cerium dioxide thin films

Author

Sundaram, K.B. ; Wahid, P.F. ; Melendez, O.

Author_Institution

Dept. of Electr. Eng. & Commun. Sci., Univ. of Central Florida, Orlando, FL, USA

fYear

1996

fDate

11-14 Apr 1996

Firstpage

677

Lastpage

679

Abstract

Cerium dioxide is a rare earth oxide material which may be useful for various optical and electronic applications because of its high refractive index and dielectric constant. Cerium dioxide thin films were deposited on to glass substrates using r.f. magnetron sputtering. A cerium dioxide target was used for sputtering and films were deposited for various oxygen-argon gas flow ratios under different sputtering power levels. X-ray photoelectron spectroscopy analysis were performed on these films and the results are presented in terms of deposition conditions

Keywords

X-ray photoelectron spectra; binding energy; cerium compounds; optical films; photoemission; sputter deposition; CeO₂; CeO₂ thin films; RF magnetron sputtering; X-ray photoelectron spectroscopy; binding energies; deposition conditions; dielectric constant; electronic applications; glass substrates; optical applications; rare earth oxide material; refractive index; sputter deposition; sputtering power levels; Cerium; Dielectric materials; Magnetic materials; Optical films; Optical materials; Optical refraction; Optical variables control; Refractive index; Spectroscopy; Sputtering;

fLanguage

English

Publisher

ieee

Conference_Titel

Southeastcon '96. Bringing Together Education, Science and Technology., Proceedings of the IEEE

Conference_Location

Tampa, FL

Print_ISBN

0-7803-3088-9

Type

conf

DOI

10.1109/SECON.1996.510156

Filename

510156