DocumentCode :
2205342
Title :
A look into the future for SiGe HBTs
Author :
Harame, D.L. ; Freeman, G. ; Rieh, J. ; Jagannathan, B. ; Greenberg, D. ; Joseph, A. ; Johnson, J. ; Guarin, F. ; Yang, Z. ; Ahlgren, D. ; Cottrell, P. ; Dunn, J. ; Orner, B. ; Subbanna, S.
fYear :
2003
fDate :
25-27 Aug. 2003
Firstpage :
207
Lastpage :
208
Abstract :
In this paper, we focus on the reliability of SiGe HBTs related to scaling. HBT performance will continues to increase with no forceable significant reliability roadblocks. Designers will need to pay attention to the configuration and use conditions of the transistor.
Keywords :
Ge-Si alloys; heterojunction bipolar transistors; semiconductor device reliability; semiconductor materials; HBT performance; SiGe; SiGe HBT; reliability roadblocks; transistor; Current density; Degradation; Electromigration; Germanium silicon alloys; Heating; Heterojunction bipolar transistors; Impact ionization; Rivers; Silicon germanium; Thermal resistance;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Compound Semiconductors, 2003. International Symposium on
Print_ISBN :
0-7803-7820-2
Type :
conf
DOI :
10.1109/ISCS.2003.1239978
Filename :
1239978
Link To Document :
بازگشت