DocumentCode
2205650
Title
Growth of crystal silicon by PMCZ method
Author
Zhang, Weilian ; Tan, Baimei ; Li, Jiaxi ; Sun, Junsheng ; Zhang, Enhuai
Author_Institution
Hebei Univ. of Technol., Tianjin, China
Volume
1
fYear
2001
fDate
2001
Firstpage
280
Abstract
In this paper, we present our research on the growth of CZSi in a ring permanent magnetic field (PMCZ). It was shown that in the ring permanent magnetic field thermal convection in melt and centrifugal pumping flows due to crystal rotation can be strongly suppressed so that the fluctuations of temperature and micro-growth rate at interface are restrained effectively. The oxygen concentration in as-grown crystal is lower and the dopant is more homogeneous. The mechanism of the effect of the permanent magnetic field on the growth of CZSi is also discussed
Keywords
convection; crystal growth from melt; elemental semiconductors; oxygen; semiconductor technology; silicon; zero gravity experiments; O concentration; O impurity; Si:O; centrifugal pumping; diffusion kinetics; fluctuations of temperature; melt; micro-growth; ring permanent magnetic field; thermal convection; Electromagnetic fields; Gravity; Impurities; Magnetic devices; Magnetic fields; Oxygen; Silicon; Temperature; Thermal conductivity; Thermal expansion;
fLanguage
English
Publisher
ieee
Conference_Titel
Solid-State and Integrated-Circuit Technology, 2001. Proceedings. 6th International Conference on
Conference_Location
Shanghai
Print_ISBN
0-7803-6520-8
Type
conf
DOI
10.1109/ICSICT.2001.981473
Filename
981473
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