• DocumentCode
    2206408
  • Title

    Initial microwave generation from the vircator system with various anode-cathode (A-K) gap distances

  • Author

    Choi, M.C. ; Jung, Y. ; Song, G.B. ; Sung, G.Y. ; Choi, E.H.

  • Author_Institution
    Dept. of Electrophys., Kwangwoon Univ., Seoul, South Korea
  • fYear
    2002
  • fDate
    26-30 May 2002
  • Firstpage
    152
  • Abstract
    Summary form only given, as follows. The microwave output of vircator system has been shown to be dependent especially on diode anode-cathode (A-K) gap distance. The initial microwave generation time is delayed when the A-K gap distance has been increased from 2 to 8 mm in this experiment, and also it is shown that the central microwave frequency f is inversely scaled as the A-K gap distance. When the electron beam is generated from the cathode, the electrode sheath plasma is also generated just after the peak diode voltage on the electrodes, hence the perveance of diode is being varied to change the diode output characteristics at this moment. In our pulsed power system chundoong, the perveance characteristics had been experimentally investigated, from which the sheath plasma expansion speed could be found to be about 3 cm//spl mu/s inside the diode. It could be shown in this experiment that the microwave output power becomes to be maximum when the effective A-K gap distance due to the sheath plasma expansion becomes to be around 3 mm from the initial-set A-K gap distances. It means that there might be threshold effective A-K gap condition, at which the maximum microwave power could be achieved by virtual cathode oscillator formed by the injected electron beam current exceeding the space charge limited current.
  • Keywords
    microwave generation; plasma sheaths; space-charge-limited conduction; vircators; diode output characteristics; diode perveance; electrode sheath plasma; initial microwave generation; injected electron beam current; microwave output; pulsed power system; sheath plasma expansion; space charge limited current; threshold effective gap condition; various anode-cathode gap distances; vircator system; virtual cathode oscillator; Cathodes; Character generation; Delay effects; Diodes; Electrodes; Electron beams; Microwave generation; Plasma properties; Plasma sheaths; Pulse power systems;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Plasma Science, 2002. ICOPS 2002. IEEE Conference Record - Abstracts. The 29th IEEE International Conference on
  • Conference_Location
    Banff, Alberta, Canada
  • Print_ISBN
    0-7803-7407-X
  • Type

    conf

  • DOI
    10.1109/PLASMA.2002.1030347
  • Filename
    1030347